首页> 中文期刊> 《中国物理快报:英文版》 >Electrical Activity of Frank Partial Dislocations and the influence of Metallic Impurities in Czochralski-Grown Silicon

Electrical Activity of Frank Partial Dislocations and the influence of Metallic Impurities in Czochralski-Grown Silicon

         

摘要

Electrical activity of Frank partial dislocations bounding stacking faults and the influence of Fe impurities in Czochralski-grown silicon are investigated by means of the electron-beam-induced-current(EBIC)technique.Frank partials free from metallic impurities exhibit EBIC contrast at low temperature but not at room temperature,indicating that they are only accompanied with shallow energy levels in the band gap.The energy level related to a Frank partial is determined to be about Ec-0.08eV in n-type Si.Frank partials decorated by Fe impurities become EBIC active at room temperature.

著录项

  • 来源
    《中国物理快报:英文版》 |1997年第6期|P.436-439|共4页
  • 作者单位

    Department of Physics Institute of Solid Solid State Physics Nanjing University Nanjing 210093;

    Department of Physics Institute of Solid Solid State Physics Nanjing University Nanjing 210093;

    Department of Physics Institute of Solid Solid State Physics Nanjing University Nanjing 210093;

    Department of Physics Institute of Solid Solid State Physics Nanjing University Nanjing 210093;

    Department of Physics Institute of Solid Solid State Physics Nanjing University Nanjing 210093;

    Department of Physics Institute of Solid Solid State Physics Nanjing University Nanjing 210093;

    Institute for Materials Research Tohoku University Sendai 980 Japan;

    Institute for Materials Research Tohoku University Sendai 980 Japan;

  • 原文格式 PDF
  • 正文语种 chi
  • 中图分类 半导体物理学;
  • 关键词

    temperature.; technique.; Czochralski;

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