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Microstructural Characterization of Epitaxial GaAs on Separation-by-Implanted-Oxygen Substrates

机译:外延GaAs在分离型氧衬底上的显微组织特征

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摘要

The direct growth of GaAs by molecular-beam epitaxy on separation-by-implanted-oxygen substrates is demonstrated.Cross-sectional trajismission electron microscopyt Rutherford backsca,ttering and channeling techniques have been employed to characterize these layers.Microtwins and threading disloca-£ion are the predominant defects in the layers.Most of the misfit dislocation are conGned within the Ga.As and Si interface region by forming a type of edge dislocation.

著录项

  • 来源
    《中国物理快报:英文版》 |1991年第10期|P.529-532|共4页
  • 作者单位

    Ion Beam Laboratory Shanghai Institute of Metallurgy Academia Sinica Shanghai 200050;

    Ion Beam Laboratory Shanghai Institute of Metallurgy Academia Sinica Shanghai 200050;

    Ion Beam Laboratory Shanghai Institute of Metallurgy Academia Sinica Shanghai 200050;

    Ion Beam Laboratory Shanghai Institute of Metallurgy Academia Sinica Shanghai 200050;

    Ion Beam Laboratory Shanghai Institute of Metallurgy Academia Sinica Shanghai 200050;

    Department of Electronic and Electric&l Engineering University of Surrey Guildford GU25HX United Kingdom;

  • 收录信息 中国科学引文数据库(CSCD);
  • 原文格式 PDF
  • 正文语种 chi
  • 中图分类 半导体技术;
  • 关键词

    Oxygen; sectional; separation;

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