Fabricating Master with Reactive Ion Beam Etching Method

邹志强; 方红丽; 傅新定; 陈国明

首页> 中文期刊> 《中国物理快报：英文版》 >Fabricating Master with Reactive Ion Beam Etching Method

Fabricating Master with Reactive Ion Beam Etching Method

开具论文收录证明 >>

期刊封面封底目录下载 >>

文献代查 >>

页面导航

摘要
著录项
相关主题

摘要

The fabrication process of glass master or glass etching optical disk using reactive ion beam(RIB)etching method was studied.Photoresist was applied for image reversal.RIB etching using CF4 gas transferred the pregrooves into the glass substrate.The shape and depth of the pregrooves in the glass is a function of the RIB etcher settings.A glass substrate ofФ130mm with etched pregrooves(track pitch was 1.6μm and groove depth 0.1μm)was obtained,showing that a glass master or glass etching disc can be fabricated by this technique.

著录项

来源
《中国物理快报：英文版》 |1998年第7期|P.495-497|共3页
作者
邹志强; 方红丽; 傅新定; 陈国明;
展开▼
作者单位

Shanghai Institute of Metallurgy Chinese Academy of Sciences Shanghai 200050;

Shanghai Institute of Metallurgy Chinese Academy of Sciences Shanghai 200050;

Shanghai Institute of Metallurgy Chinese Academy of Sciences Shanghai 200050;

Shanghai Institute of Metallurgy Chinese Academy of Sciences Shanghai 200050;

展开▼
原文格式 PDF
正文语种 chi
中图分类半导体技术;
关键词
technique; glass; Master;

客服邮箱：kefu@zhangqiaokeyan.com

客服微信
服务号

Fabricating Master with Reactive Ion Beam Etching Method

摘要

著录项

相关主题

期刊订阅