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首页> 中文期刊> 《中国物理快报：英文版》 >Plasma Enhanced Chemical Vapor Deposition Synthesizing Carbon Nitride Hard Thin Films

Plasma Enhanced Chemical Vapor Deposition Synthesizing Carbon Nitride Hard Thin Films

         
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摘要

Using plasma enhanced chemical vapor deposition and SiC and carbon buffer layers,we have obtained carbon nitride thin films on Si(100)and Si(111).The x-ray diffraction and x-ray photoelectron spectroscopy are used to characterize the thin films.The Vickers hardness of the carbon nitride thin films is more than 5100kgf/mm2 and comparable to that of diamond.

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