以两套80 kt/a甲基氯硅烷合成装置为研究对象，探讨了反应压力对氯甲烷空床线速度、硅-铜触体转化率、氯甲烷单级转化率及二甲选择性的影响。结果表明，压力为0.23 MPa时，氯甲烷空床线速度较高，反应温度更易实现平稳控制，同时可获得更高的硅-铜触体转化率及氯甲烷单级转化率，但二甲选择性却较0.30 MPa时低。%The effect of different reaction pressures on methyl chloride linear velocity, silicon-copper mass conversion rate, methyl chloride single pass conversion and dimethyldichlorosilane selectivity was investigated in two 80 kt/a methylchlorosilane synthesis devices. The results show that the methyl chloride has higher linear velocity and the stationary control of reaction temperature is easier to implement at 0.23 MPa. Although the higher silicon-copper mass conversion rate and methyl chloride single pass conversion can be acquired, the dimethyldichlorosilane selectivity is lower than that at 0.30 MPa.
展开▼
