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首页> 中文期刊> 《流体动力学（英文）》 >Introduction of a New Baffle-Plate Concept to Control the Gas Flow Behavior in a Large Volume PECVD Chamber

Introduction of a New Baffle-Plate Concept to Control the Gas Flow Behavior in a Large Volume PECVD Chamber

         
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Achieving a reasonable homogeneity of the coating deposition rate within a low-pressure plasma process is a challenge, especially in large volume chambers. The local gas flow behavior is one key parameter in the coating deposition. Basically, with the exception of the product geometry and the electrode design, there are two main influences on the gas flow distribution inside a large volume chamber: 1) gas feed-in system and 2) gas exhaustion system. This work focuses on the gas exhaustion system with the aim to reduce its influence on the gas flow behavior inside a large plasma coater. In this sense, a solution with a perforated plate, named “Baffle-Plate”, is created. Thereby relevant construction parameters are identified and investigated to understand their influence in respect to the homogeneity of the gas exhaustion. Number of holes, hole diameter, distance of the Baffle-Plate to the top of the chamber, gas flow and chamber volume are evaluated parameters. Computational fluid dynamics (CFD) simulations are used as a tool to determine velocity and pressure distribution inside the PECVD-chamber and, consequently, to evaluate the layout parameters of the Baffle-Plate. Additionally, practical coating experiments with and without the Baffle-Plate installed are performed. The results show a correlation between the gas flow distribution and the homogeneity of the coating deposition rate. With these results construction guidelines have been formulated. Hence in future developments correct technical layouts of the Baffle-Plate can be applied, easily.

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