Deposition of Titanium Layer on Steel Substrate Using PECVD Method: A Parametric Study

Haman Hedaiatmofidi; Alireza Sabour Rouh Aghdam; Shahrokh Ahangarani; Mansour Bozorg; Mahboube Azadi; Maryam Valiei

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Deposition of Titanium Layer on Steel Substrate Using PECVD Method: A Parametric Study

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Metallic titanium film was deposited on H-13 steel substrate at 470°C - 530°C using plasma enhanced chemical vapor deposition (PECVD) method. In this paper, the effects of manufacturing parameters were investigated on deposited titanium coating characteristics. XRD, FESEM, XPS and AFM were used in order to study coating characteristics. Increasing hydrogen flow rate from 200 to 360 sccm, resulted in a 72% decrease in oxygen content and 38% decrease in chlorine content of the film. Applied plasma voltage has a severe effect on nanohardness of coating. Pressure of the deposition chamber has a negative effect on titanium characteristics.

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《材料科学与应用期刊（英文）》 |2014年第3期|140-148|共9页
作者
Haman Hedaiatmofidi; Alireza Sabour Rouh Aghdam; Shahrokh Ahangarani; Mansour Bozorg; Mahboube Azadi; Maryam Valiei;
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作者单位

Advanced Materials & Renewable Energies Department;

Iranian Research Organization for Science and Technology;

Tehran;

Iran;

Material Science and Technology;

Azad University;

Tehran;

Iran;

Surface Engineering Laboratory;

Materials Engineering Department;

Faculty of Engineering;

Tarbiat Modares University;

Tehran;

Iran;

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原文格式 PDF
正文语种 chi
中图分类化学;
关键词
PECVD; Titanium; Layer; Oxygen; Content; XPS;

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Deposition of Titanium Layer on Steel Substrate Using PECVD Method: A Parametric Study

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