The sintering additives such as Al2O3 and/or Y2O3 were coated on the surfaces of Si3N4 particles via heterogeneous nucleation processing using a buffered pH solution as the precipitation reagent. They nucleated and grew only on the surfaces of Si3N4 and did not form sol particles in solution by TEM observation. The isoelectric point (IEP) of coated Si3N4 was different from that of as-received Si3N4. The IEP of AI(OH)3-coated Si3N4 occurred at pH8.4, which is close to that of alumina. When AI(OH)3-coated Si3N4 particles were coated with Y(OH)3, the IEP of coated Si3N4 powder shifted from pH8.4 to pH9.2, similar to that of yttria. In addition, the rheological data showed that Al2O3 and/or Y2O3 coated Si3N4 suspension is nearly Newtonian and that added Si3N4 suspension shows a shear rate thinning behavior.
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机译：atRH57, a DEaD-box RNa helicase, is involved in feedback inhibition of glucose-mediated abscisic acid accumulation during seedling development and additively affects pre-ribosomal RNa processing with high glucose
