首页> 中文期刊> 《强激光与粒子束》 >外加偏置电场下类金刚石薄膜激光损伤形貌

外加偏置电场下类金刚石薄膜激光损伤形貌

         

摘要

使用非平衡测控溅射技术沉积了类金刚石薄膜,对比了外加偏置电场前后薄膜的抗激光损伤表面形貌变化,发现薄膜施加偏置电场后,薄膜的激光损伤区域内有大量丝状薄膜,损伤形貌存在明显不同,损伤面积减小,薄膜的激光损伤情况得到改善.这表明外加偏置电场对薄膜的损伤有影响,激光在薄膜中激励产生的光生电子在电场作用下产生快速漂移,间接降低了激光辐照区域内的局部能量密度,减缓了薄膜的石墨化,提高了薄膜的抗激光损伤能力.%Diamond-like carbon(DLC) films were deposited by un-balanced magnetron sputtering(UBMS) technology and a comparison of their damage morphologies with and without external electric field was then made. With the applied electric field, a large amount of filiform films appeared and the damaged area decreased as well. Thus the external electric field influences the damage morphology of DLC films. Under the influence of the electric field, the photoelectrons excited by laser in the films will perform a speedy movement, which indirectly reduces the energy density in some parts of the laser-irradiated area and slows down the graphitizing process of the films. As a result, the films are more difficult to be damaged by laser.

著录项

相似文献

  • 中文文献
  • 外文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号