首页> 中文期刊> 《电子科技学刊》 >Method Investigation for Fabricating Micro-Optical Elements by Use of Half Tone Masks

Method Investigation for Fabricating Micro-Optical Elements by Use of Half Tone Masks

         

摘要

Several approaches to fabricate micro optical elements by use of half tone masks are studied and compared. It is shown that half tone masks employed in filtering image systems can obtain gray patterns with considerably high precision, but it is hard to operate from the viewpoint of operation. The method using contacting lithography technology or laser ablation can be easily operated with the cost of reducing fabrication precision and the trouble of choosing appropriate materials. For all of these methods, the coding of half tone masks with corrections for the nonlinear characteristics of coding, imaging and photoresist is recommended.

著录项

  • 来源
    《电子科技学刊》 |2010年第2期|131-134|共4页
  • 作者

    Tong-Kai Zhao; Qin Feng;

  • 作者单位

    Department of Optics and Electronics,University of Electronic Science and Technology of China,Chengdu 610054,China;

    Institute of Optics end Electronics,Chinese Academy of Sciences,Chengdu 610209,China;

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  • 正文语种 chi
  • 中图分类
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