Compressive Sensing Approaches for Lithographic Source and Mask Joint Optimization

著录项

• 来源
  《微电子制造学报》 |2018年第2期|P.6-12|共7页
• 作者

  Xu Ma; Zhiqiang Wang; Gonzalo R.Arce;

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• 作者单位

  [1]Key Laboratory of Photoelectronic Imaging Technology and System of Ministry of Education of China;

  School of Optics and Photonics;

  Beijing Institute of Technology;

  Beijing;

  100081;

  China;

  [1]Key Laboratory of Photoelectronic Imaging Technology and System of Ministry of Education of China;

  School of Optics and Photonics;

  Beijing Institute of Technology;

  Beijing;

  100081;

  China;

  [2]Department of Electrical and Computer Engineering;

  University of Delaware;

  Newark;

  DE;

  19716;

  USA;

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• 原文格式 PDF
• 正文语种 CHI
• 中图分类 无线电电子学、电信技术;
• 关键词

  Computational lithography; source mask optimization(SMO); compressive sensing(CS); inverse problem;