利用磁控溅射法在不同基底偏压条件下制备了CrN/Si3N4纳米多层膜,分别用X射线衍射仪、原子力显微镜及纳米压痕仪表征多层膜的微观结构及力学性能,结果表明,衬底偏压对CrN/Si3N4纳米多层膜微观结构、界面结构、硬度和磨损性能有重要影响.漂浮电位时多层膜界面粗糙,CrN呈(200)、(111)共同生长,硬度和弹性模量低,有偏压且变化时界面宽度和粗糙度变化不大,硬度和模量变化的主要原因是不同衬底偏压下的晶格畸变导致两层材料弹性模量变化和晶粒尺寸变化.基底偏压的优化有助于改善涂层的屈服应力和断裂韧性.%CrN/Si3 N4 multilayer coatings were deposited at different substrate bias by reactive magnetron sputtering.The results show that there are important effects for substrate bias on the microstructure,interface and mechanical properties of the coatings.The interface is more rough and the microstructure is (200) and (111) texture when there isn't substrate bias.It results in a low hardness and modulus for CrN/Si3 N4 multilayer.The interface width and roughness almost unchanged with the increase of the bias.The variation of hardness and modulus are attributed to the changes in grain size and modulus variation caused by crystalline distortion.Compared to sample without bias,the yield stress (resistance to plastic deformation) and fracture toughness (resistance to crack propagation)would be improved by substrate bias.
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