The development and trend of international and internal polysilicon are investigated. And the merits and shortcomings of various methods for preparation of polysilicon are introduced and compared. The basic theory, reaction mechanism of chemical vapor deposition are presented. Finally, the theory, development and problems of flui-di-zed chemical vapor deposition of polysilicon are reviewed. The results show that the fluidized bed chemical vapor deposition (FBCVD) method is a most promising alternative to conventional ones. The model to describe the CVD process is needed to improve. Especially for FBCVD, the coupled model of momentum,heat and mass transportation is needed.%简述了国内外多晶硅生产工艺的发展和现状,介绍和比较了各种多晶硅的制备方法在产能、能耗及环境友好特性等方面的特点.介绍了多晶硅CVD的原理、反应机理及其研究方法,综述了流态化多晶硅CVD的基本原理、研究现状以及存在的问题.分析表明:利用硅烷流态化技术最有希望降低多晶硅生产成本;数值模拟作为描述CVD过程的重要手段需要进一步完善其模型,特别是对流态化CVD过程,需要建立各种物理化学现象的耦合作用模型.
展开▼
