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对靶磁控溅射Co/TiO2薄膜制备和表征

         

摘要

In order to studied the influence of Co concentration on Co/TiO2 magnetic properties and microstructure,Co/TiO2thin films have been fabricated by DC facing-target magnetron sputtering and subsequently annealed in situ vacuum.The morphologies and domain structures were observed by X-ray diffraction and scanning probe microscope.The magnetic properties were measured by vibrating sample magnetometer.Studies show that the microstructure and magnetic properties of the films are greatly affected by the concentration of Co.The amount of clusters increases with increasing Co content in Co/TiO2 thin films.The hysteresis loop shows that there is good magnetic property at room temperature.Co clusters having a soft magnetic property decrease the value of the coercive field.The low Co content of the Co/TiO2 thin films are considered to have a lower slope at low temperature.The structure is anatase.%为了研究稀磁半导体Co/TiO2薄膜的微观结构和磁性,进一步探讨制备工艺和测量方法对稀磁半导体薄膜材料的影响.通过高真空对靶直流磁控溅射装置和原位退火工艺制备了Co/TiO2薄膜样品,然后利用扫描探针显微镜、振动样品磁强计和X射线衍射仪对所制得的薄膜样品的磁性和微结构进行了研究,发现磁性金属Co的掺杂量对Co/TiO2薄膜的结构及磁性有重要影响.结果表明:样品的表面粗糙度和颗粒尺寸随磁性金属含量升高而增大;随着Co百分含量的升高,形成的薄膜样品Co/TiO2和Co金属混合结构会减小矫顽力;对于Co含量较低样品其磁滞回线的斜率在低温测量时得到的结果明显小于室温环境的结果,归因于受到了顺磁相的影响.由X射线衍射结果可知此时样品为锐钛矿结构.

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