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Ultrathin Ferroelectric Films: Growth Characterization Physics and Applications

机译:超薄铁电薄膜:生长表征物理和应用

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摘要

Ultrathin ferroelectric films are of increasing interests these years, owing to the need of device miniaturization and their wide spectrum of appealing properties. Recent advanced deposition methods and characterization techniques have largely broadened the scope of experimental researches of ultrathin ferroelectric films, pushing intensive property study and promising device applications. This review aims to cover state-of-the-art experimental works of ultrathin ferroelectric films, with a comprehensive survey of growth methods, characterization techniques, important phenomena and properties, as well as device applications. The strongest emphasis is on those aspects intimately related to the unique phenomena and physics of ultrathin ferroelectric films. Prospects and challenges of this field also have been highlighted.
机译:近年来,由于需要装置小型化及其广泛的吸引人的特性,超薄铁电薄膜受到越来越多的关注。最新的先进沉积方法和表征技术已大大拓宽了超薄铁电薄膜的实验研究范围,推动了深入的性能研究和有希望的器件应用。这篇综述旨在涵盖超薄铁电薄膜的最新实验研究成果,并对生长方法,表征技术,重要现象和特性以及器件应用进行全面调查。最重要的方面是与超薄铁电薄膜的独特现象和物理原理密切相关的方面。该领域的前景和挑战也得到了强调。

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