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首页> 美国卫生研究院文献>Applied and Environmental Microbiology >Potential Repair of Escherichia coli DNA following Exposure to UV Radiation from Both Medium- and Low-Pressure UV Sources Used in Drinking Water Treatment
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Potential Repair of Escherichia coli DNA following Exposure to UV Radiation from Both Medium- and Low-Pressure UV Sources Used in Drinking Water Treatment

机译：饮用水处理中低压紫外线源暴露于紫外线辐射后大肠杆菌DNA的潜在修复

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The increased use of UV radiation as a drinking water treatment technology has instigated studies of the repair potential of microorganisms following treatment. This study challenged the repair potential of an optimally grown nonpathogenic laboratory strain of Escherichia coli after UV radiation from low- and medium-pressure lamps. Samples were irradiated with doses of 5, 8, and 10 mJ/cm2 from a low-pressure lamp and 3, 5, 8, and 10 mJ/cm2 from a medium-pressure UV lamp housed in a bench-scale collimated beam apparatus. Following irradiation, samples were incubated at 37°C under photoreactivating light or in the dark. Sample aliquots were analyzed for up to 4 h following incubation using a standard plate count. Results of this study showed that E. coli underwent photorepair following exposure to the low-pressure UV source, but no repair was detectable following exposure to the medium-pressure UV source at the initial doses examined. Minimal repair was eventually observed upon medium-pressure UV lamp exposure when doses were lowered to 3 mJ/cm2. This study clearly indicates differences in repair potential under laboratory conditions between irradiation from low-pressure and medium-pressure UV sources of the type used in water treatment.
机译：越来越多地将紫外线辐射用作饮用水处理技术，已开始研究处理后微生物的修复潜力。这项研究挑战了在低压和中压灯照射紫外线后，最佳生长的非致病性大肠杆菌实验室菌株的修复潜力。从低压灯分别以5、8和​​10 mJ / cm 2 的剂量对样品进行辐照，从3、5、8和10 mJ / cm 2 的剂量对样品进行辐照。安装在台式准直光束设备中的中压紫外线灯。辐照后，将样品在光活化或暗光条件下于37°C孵育。孵育后，使用标准板数对样品等分试样进行长达4小时的分析。这项研究的结果表明，大肠杆菌在暴露于低压紫外线源后进行了光修复，但在以初始检查剂量暴露于中压紫外线源后未检测到修复。当剂量降低到3 mJ / cm 2 时，在中压紫外线灯下最终观察到最小的修复。这项研究清楚地表明，在实验室条件下，低压和中压紫外线源（在水处理中使用的这种类型）的辐射之间的修复潜力存在差异。

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