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Nonlinear continuum growth model of multiscale reliefs as applied to rigorous analysis of multilayer short-wave scattering intensity. I. Gratings

机译:多尺度浮雕的非线性连续体增长模型用于严格分析多层短波散射强度。 I.光栅

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摘要

It is shown that taking into proper account certain terms in the nonlinear continuum equation of thin-film growth makes it applicable to the simulation of the surface of multilayer gratings with large boundary profile heights and/or gradient jumps. The proposed model describes smoothing and displacement of Mo/Si and Al/Zr boundaries of gratings grown on Si substrates with a blazed groove profile by magnetron sputtering and ion-beam deposition. Computer simulation of the growth of multilayer Mo/Si and Al/Zr gratings has been conducted. Absolute diffraction efficiencies of Mo/Si and Al/Zr gratings in the extreme UV range have been found within the framework of boundary integral equations applied to the calculated boundary profiles. It has been demonstrated that the integrated approach to the calculation of boundary profiles and of the intensity of short-wave scattering by multilayer gratings developed here opens up a way to perform studies comparable in accuracy to measurements with synchrotron radiation, at least for known materials and growth techniques.
机译:结果表明,在薄膜生长的非线性连续方程中适当考虑某些条件,使其可用于模拟具有大边界轮廓高度和/或梯度跳变的多层光栅的表面。所提出的模型描述了通过磁控溅射和离子束沉积在具有闪耀凹槽轮廓的Si衬底上生长的光栅的Mo / Si和Al / Zr边界的平滑和位移。进行了多层Mo / Si和Al / Zr光栅生长的计算机模拟。在应用于计算边界轮廓的边界积分方程的框架内,已发现Mo / Si和Al / Zr光栅在极端UV范围内的绝对衍射效率。业已证明,此处开发的多层光栅计算边界轮廓和短波散射强度的综合方法为研究至少在已知材料和同步加速器辐射方面提供了可与同步辐射测量相当的方法。生长技术。

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