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Double-walled iron oxide nanotubes via selective chemical etching and Kirkendall process

机译：通过选择性化学刻蚀和柯肯达尔工艺制备的双壁氧化铁纳米管

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Double-walled oxide nanotube structures are interesting for a wide range of applications, from photocatalysis to drug delivery. In this work, a progressive oxidation method to fabricate double-walled nanotube structures is reported in detail. The approach is based on the electrodeposition of metallic iron nanowires, in porous alumina templates, followed by a selective chemical etching, nanoscale Kirkendall effect, a fast oxidation and out-diffusion of the metallic core structure during thermal annealing. To validate the formation mechanism of such core-shell structure, chemical composition and atomic structure were assessed. The resulting hematite nanotubes have a high degree of uniformity, along several microns, and a nanoscopic double-walled structure.

机译：从光催化到药物递送，双壁氧化物纳米管结构对于广泛的应用是令人感兴趣的。在这项工作中，详细报道了逐步氧化方法来制造双壁纳米管结构。该方法基于在多孔氧化铝模板中金属铁纳米线的电沉积，然后进行选择性化学蚀刻，纳米级柯肯德尔效应，在热退火过程中金属芯结构的快速氧化和向外扩散。为了验证这种核-壳结构的形成机理，评估了化学组成和原子结构。所得的赤铁矿纳米管沿几微米具有高度均匀性，并且具有纳米级双壁结构。

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期刊名称 Scientific Reports
作者
João Azevedo; M. P. Fernández-García; César Magén; Adélio Mendes; João P. Araújo; Célia T. Sousa;
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年(卷),期 -1(9),-1
年度 -1
页码 11994
总页数 8
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1. Double-walled iron oxide nanotubes via selective chemical etching and Kirkendall process [J] . Jo?o Azevedo, M. P. Fernández-García, César Magén, Scientific reports. . 2019,第1期

机译：通过选择性化学蚀刻和KIRKENDALL工艺双墙氧化铁纳米管
2. Selective and Scalable Chemical Removal of Thin Single-Walled Carbon Nanotubes from their Mixtures with Double-Walled Carbon Nanotubes [J] . Kominkova Zuzana, Vales Vaclav, Kalbac Martin Chemistry: A European journal . 2015,第45期

机译：从薄壁单壁碳纳米管与双壁碳纳米管的混合物中进行选择性和可扩展的化学去除
3. Selective and Scalable Chemical Removal of Thin Single-Walled Carbon Nanotubes from their Mixtures with Double-Walled Carbon Nanotubes [J] . Kominkova Zuzana, Vales Vaclav, Kalbac Martin Chemistry: A European journal . 2015,第45期

机译：从薄壁单壁碳纳米管与双壁碳纳米管的混合物中进行选择性和可扩展的化学去除
4. A Selective Etching Process for Chemically Inert Migh-k Metal Oxides [C] . Katherine L.Saenger, Harald F.Okorn-Schmidt, Christopher P.DEmic Materials Research Society Symposium . 2003

机译：用于化学惰性MIGH-K金属氧化物的选择性蚀刻方法
5. The characterization of octafluorocyclobutane-based plasma discharges for the selective etching and processing of silicon dioxide and low-K dielectric thin films. [D] . Barela, Marcos J. 2003

机译：基于八氟环丁烷的等离子放电的特征，用于二氧化硅和低K介电薄膜的选择性刻蚀和处理。
6. A systematic study of the controlled generation of crystalline iron oxide nanoparticles on graphene using a chemical etching process [O] . Peter Krauß, Jörg Engstler, Jörg J Schneider 2017

机译：使用化学蚀刻工艺对石墨烯上晶体氧化铁纳米颗粒的受控生成进行系统研究
7. Synthesis of superparamagnetic iron(III) oxide nanowires in double-walled carbon nanotubes [O] . Tîlmaciu Carmen, Soula Brigitte, Galibert Anne-Marie, 2009

机译：双壁碳纳米管中超顺磁性氧化铁（III）纳米线的合成
8. Selective suppression of photochemical etching: Raman spectroscopy for pre-etch process selection [R] . Ashby, CIH, Myers 1992

机译：光化学蚀刻的选择性抑制：用于预蚀刻工艺选择的拉曼光谱

Double-walled iron oxide nanotubes via selective chemical etching and Kirkendall process

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