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首页> 美国卫生研究院文献>Scientific Reports >Ellipsoidal mirror for two-dimensional 100-nm focusing in hard X-ray region
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Ellipsoidal mirror for two-dimensional 100-nm focusing in hard X-ray region

机译：椭圆形反射镜用于在硬X射线区域进行二维100 nm聚焦

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摘要

Cutting-edge hard X-ray microscopy strongly depends on sophisticated focusing optics and ultrabright X-ray sources at synchrotron-radiation and X-ray free-electron laser (XFEL) facilities. These facilities typically provide two-dimensional nanofocusing X-ray beams by combining one-dimensional focusing mirrors. However, single-reflecting two-dimensional focusing mirrors with an ellipsoidal surface, which are well-known to possess high efficiency, have limited microfocusing applications. In this paper, we present an ultrahigh-precision ellipsoidal mirror for two-dimensional X-ray nanofocusing by overcoming the difficulties faced in the manufacturing process of its aspherical surface, including the surface-processing methods and surface metrology. The developed mirror has nanoscale accuracy, and it achieves focus size of 85 nm × 125 nm (full width at half maximum) using 7-keV X-rays. Two-dimensional focus was demonstrated in the same focal plane by resolving 50-nm test structures by scanning X-ray microscopy using a focusing beam. These achievements represent an important first step toward realizing two-dimensional aspherical mirrors with complex designs, in addition to ultralow loss and unprecedented small focusing property for extensive optical applications in synchrotron-radiation and XFEL facilities as well as in other scientific fields that require ultraprecision optical surfaces.
机译：尖端的硬X射线显微镜在很大程度上依赖于同步辐射和X射线自由电子激光（XFEL）设施上的精密聚焦光学器件和超亮X射线源。这些设施通常通过组合一维聚焦镜来提供二维纳米聚焦X射线束。然而，众所周知具有高效率的具有椭圆形表面的单反射二维聚焦镜具有有限的微聚焦应用。在本文中，我们克服了非球面非球面制造过程中的困难，包括表面加工方法和表面计量学，提出了一种用于二维X射线纳米聚焦的超高精度椭球面镜。研制的反射镜具有纳米级精度，并且使用7-keV X射线可实现85 nm×125 nm的聚焦尺寸（最大一半的全宽）。通过使用聚焦光束的扫描X射线显微镜解析50纳米测试结构，在同一焦平面上显示了二维焦点。这些成就是实现具有复杂设计的二维非球面镜的重要第一步，此外，超低损耗和空前的小聚焦特性使其可广泛用于同步加速器辐射和XFEL设施以及需要超精密光学的其他科学领域中的广泛光学应用表面。

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