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Nearly diffraction-limited X-ray focusing with variable-numerical-aperture focusing optical system based on four deformable mirrors

机译:基于四个变形镜的可变数值孔径聚焦光学系统的近衍射极限X射线聚焦

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摘要

Unlike the electrostatic and electromagnetic lenses used in electron microscopy, most X-ray focusing optical systems have fixed optical parameters with constant numerical apertures (NAs). This lack of adaptability has significantly limited application targets. In the research described herein, we developed a variable-NA X-ray focusing system based on four deformable mirrors, two sets of Kirkpatrick–Baez-type focusing mirrors, in order to control the focusing size while keeping the position of the focus unchanged. We applied a mirror deformation procedure using optical/X-ray metrology for offline/online adjustments. We performed a focusing test at a SPring-8 beamline and confirmed that the beam size varied from 108 nm to 560 nm (165 nm to 1434 nm) in the horizontal (vertical) direction by controlling the NA while maintaining diffraction-limited conditions.
机译:与电子显微镜中使用的静电和电磁透镜不同,大多数X射线聚焦光学系统具有固定的光学参数和恒定的数值孔径(NA)。缺乏适应性已大大限制了应用目标。在本文所述的研究中,我们开发了基于四个可变形反射镜,两组Kirkpatrick-Baez型聚焦镜的可变NA X射线聚焦系统,以便控制聚焦尺寸,同时保持焦点位置不变。我们使用光学/ X射线计量学应用了镜面变形过程,以进行离线/在线调整。我们在SPring-8光束线上进行了聚焦测试,并通过控制NA并保持衍射极限条件,确定了光束尺寸在水平(垂直)方向上从108 nm到560 nm(165 nm到1434 nm)变化。

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