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All-photonic drying and sintering process via flash white light combined with deep-UV and near-infrared irradiation for highly conductive copper nano-ink

机译:闪光灯白光的全光子干燥和烧结过程结合深紫外线和近红外辐射用于高导电性铜纳米油墨

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摘要

We developed an ultra-high speed photonic sintering method involving flash white light (FWL) combined with near infrared (NIR) and deep UV light irradiation to produce highly conductive copper nano-ink film. Flash white light irradiation energy and the power of NIR/deep UV were optimized to obtain high conductivity Cu films. Several microscopic and spectroscopic characterization techniques such as scanning electron microscopy (SEM), a x-ray diffraction (XRD), and Fourier-transform infrared (FT-IR) spectroscopy were employed to characterize the Cu nano-films. Optimally sintered Cu nano-ink films produced using a deep UV-assisted flash white light sintering technique had the lowest resistivity (7.62 μΩ·cm), which was only 4.5-fold higher than that of bulk Cu film (1.68 μΩ•cm).
机译:我们开发了一种超高速光子烧结方法,该方法包括将白光(FWL)与近红外(NIR)和深紫外光照射相结合,以生产高导电性的铜纳米油墨膜。优化了闪光灯白光的照射能量和近红外/深紫外线的功率,以获得高电导率的铜膜。几种微观和光谱表征技术,例如扫描电子显微镜(SEM),X射线衍射(XRD)和傅立叶变换红外(FT-IR)光谱被用来表征Cu纳米薄膜。使用深紫外辅助闪光白光烧结技术生产的最佳烧结铜纳米油墨膜具有最低的电阻率(7.62μm·cm),仅比块状铜膜(1.68μm·cm)高4.5倍。

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