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首页> 美国卫生研究院文献>Heliyon >Trace metal analysis of element on material surface using pulse CO2 laser-induced breakdown spectroscopy applying vaporization technique
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Trace metal analysis of element on material surface using pulse CO2 laser-induced breakdown spectroscopy applying vaporization technique

机译：脉冲CO2激光诱导击穿光谱应用汽化技术的材料表面对材料表面的金属分析

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Trace elemental analysis on a surface of material has been recently imperative to be carried out especially in material industries. In this study, sophisticated setup of laser-induced breakdown spectroscopy has been arranged and demonstrated by employing vaporization technique for the trace elemental analysis on a surface of material without ablating the material itself. Experimentally, a pulse transversely excited atmospheric CO laser was directed and defocused at +5 mm on a Si surface at inclining degree of approximately 25 to vaporize the trace metal element from the Si surface to the Pt mesh combined with Cu plate. The vaporized trace metal element then attached and deposited on the mesh surface. The trace metal attached-Pt mesh was then bombarded by focused laser beam to induce a luminous plasma and finally the trace element was identified. Results certified that sensitive trace elemental analysis of Cr deposited on the Si surface has been successfully carried out without any ablation of Si surface. Good linear calibration curve of Cr with an intercept zero was produced, which results in limit of detection of Cr of approximately 100 ppb.
机译：痕量材料对材料表面的分析最近是必要的，特别是在材料行业中进行。在该研究中，通过采用蒸发技术在没有烧蚀材料本身的情况下采用蒸发技术进行蒸发技术来安排和证明了激光诱导击穿光谱的复杂设置。通过实验，在倾斜的倾斜度在大约25的倾斜度的倾斜度下以+5mm蚀刻旋转脉冲，以速度为约25，以使痕量金属元素从Si表面蒸发到与Cu板结合的Pt网格。然后将蒸发的痕量金属元素连接并沉积在网状表面上。然后通过聚焦激光束轰击痕量金属连接-PT网以诱导发光等离子体，最后鉴定了痕量元素。结果证明，在Si表面上沉积在Si表面上的Cr的敏感痕量元素分析已经成功地进行，而无需任何消融Si表面。产生截距零的Cr的良好线性校准曲线，这导致检测约100ppb的克朗的限制。

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