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首页> 美国卫生研究院文献>ACS Omega >Tailoring a Thermally Stable Amorphous SiOC Structurefor the Separation of Large Molecules: The Effect of Calcination Temperatureon SiOC Structures and Gas Permeation Properties
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Tailoring a Thermally Stable Amorphous SiOC Structurefor the Separation of Large Molecules: The Effect of Calcination Temperatureon SiOC Structures and Gas Permeation Properties

机译：量身定制热稳定的非晶SiOC结构分离大分子：煅烧温度的影响的SiOC结构和气体渗透性能

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摘要

A SiOC membrane with high oxidative stability for gas separation was tailored by utilizing vinyltrimethoxysilane, triethoxysilane, and 1,1,3,3-tetramethyldisiloxane as Si precursors. Amorphous SiOC networks were formed via the condensation of Si–OH groups, the hydrosilylation of Si–H and Si–CH=CH2 groups, and a crosslinking reaction of Si–CH3 groups, respectively. The crosslinking of Si–CH3 groups at temperatures ranging from 600 to 700 °C under a N2 atmosphere was quite effective in constructing a Si–CH2–Si unit without the formation of mesopores, which was confirmed by the results of N2 adsorption and by the gas permeation properties. The network pore size of the SiOC membrane calcined at 700 °C under N2 showed high oxidative stability at 500 °C and was appropriate for the separation of large molecules (H2/CF4 selectivity: 640, H2/SF6: 2900, N2/CF4: 98). A SiOC membrane calcined at 800 °C showed H2/N2 selectivity of 62, which was approximately 10 times higher than that calcined at 700 °C because the SiOC networks were densified by the cleavage and redistribution reactions of Si–C and Si–O groups.
机译：通过使用乙烯基三甲氧基硅烷，三乙氧基硅烷和1,1,3,3-四甲基二硅氧烷作为Si前体来定制具有高氧化稳定性的气体分离用SiOC膜。分别通过Si–OH基团的缩合，Si–H和Si–CH = CH2基团的氢化硅烷化以及Si–CH3基团的交联反应形成非晶SiOC网络。 Si-CH3基团在N2气氛下在600至700°C的温度下交联，在构建Si-CH2-Si单元时非常有效，而不会形成中孔，这被N2吸附的结果和气体渗透性能。 N2下在700°C下煅烧的SiOC膜的网络孔径在500°C下显示出高氧化稳定性，适合分离大分子（H2 / CF4选择性：640，H2 / SF6：2900，N2 / CF4： 98）。在800°C煅烧的SiOC膜显示H2 / N2选择性为62，这比在700°C煅烧的SiOC膜高约10倍，因为SiOC网络被Si–C和Si–O基团的裂解和再分布反应所致密化。

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