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Alkali Etching of Layered Double Hydroxide Nanosheets for Enhanced Photocatalytic N_2 Reduction to NH_3

机译:层状双氢氧化物纳米片的碱蚀刻用于增强的光催化N_2还原至NH_3

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摘要

Layered double hydroxide (LDH) nanosheets show good activity in a wide range of photoreactions, with this activity being generally attributable to an abundance of surface oxygen vacancies or coordinatively unsaturated metal cations in the nanosheets which serve as active sites for reactant adsorption and activation. Recently, LDH nanosheets have been shown to be very effective for photocatalytic N(2)reduction to NH(3)using water as the reducing agent. Herein, it is demonstrated that a simple pretreatment of ZnCr-LDH, ZnAl-LDH, and NiAl-LDH nanosheets with aqueous NaOH can greatly enhance the concentration of oxygen vacancies and low coordination metal centers in the nanosheets, thus significantly enhancing their photocatalytic activity for N(2)reduction to NH(3)under UV-vis irradiation (without the need for added sacrificial agents or cocatalysts). The facile alkali etching strategy introduced here is expected to be widely adopted in the future development of high-performance LDH photocatalysts for ammonia production and other challenging chemical transformations (e.g., CO(2)reduction and water splitting).
机译:层状双氢氧化物(LDH)纳米片显示出宽范围的光电液中的良好活性,该活动通常归因于纳米晶片中的富含表面氧空位或具有协调的不饱和金属阳离子,其用作反应物吸附和活化的活性位点。最近,已经显示LDH纳米片对使用水作为还原剂的光催化N(2)降低至NH(3)非常有效。在此,证明具有NaOH水溶液的ZnCr-LDH,ZNAL-LDH和Nial-LDH纳米液的简单预处理可以大大提高纳米片中的氧空位和低配位金属中心的浓度,从而显着提高了它们的光催化活性N(2)在紫外导滤辐射下还原至NH(3)(无需增加牺牲剂或助催化剂)。预计介绍的容易碱蚀刻策略预计将在未来的高性能LDH光催化剂开发中被广泛采用,用于氨生产和其他具有挑战性的化学转化(例如,CO(2)减少和水分裂)。

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  • 来源
    《Advanced energy materials》 |2020年第34期|2002199.1-2002199.9|共9页
  • 作者单位

    Chinese Acad Sci Tech Inst Phys & Chem Key Lab Photochem Convers & Optoelect Mat Beijing 100190 Peoples R China|Univ Chinese Acad Sci Ctr Mat Sci & Optoelect Engn Beijing 100190 Peoples R China;

    Chinese Acad Sci Inst High Energy Phys Beijing 100049 Peoples R China;

    Chinese Acad Sci Tech Inst Phys & Chem Key Lab Photochem Convers & Optoelect Mat Beijing 100190 Peoples R China|Univ Chinese Acad Sci Ctr Mat Sci & Optoelect Engn Beijing 100190 Peoples R China;

    Chinese Acad Sci Tech Inst Phys & Chem Key Lab Photochem Convers & Optoelect Mat Beijing 100190 Peoples R China|Univ Chinese Acad Sci Ctr Mat Sci & Optoelect Engn Beijing 100190 Peoples R China;

    Chinese Acad Sci Tech Inst Phys & Chem Key Lab Photochem Convers & Optoelect Mat Beijing 100190 Peoples R China|Univ Chinese Acad Sci Ctr Mat Sci & Optoelect Engn Beijing 100190 Peoples R China;

    Chinese Acad Sci Tech Inst Phys & Chem Key Lab Photochem Convers & Optoelect Mat Beijing 100190 Peoples R China|Univ Chinese Acad Sci Ctr Mat Sci & Optoelect Engn Beijing 100190 Peoples R China;

    Chinese Acad Sci Inst High Energy Phys Beijing 100049 Peoples R China;

    Univ Auckland Sch Chem Sci Auckland 1142 New Zealand;

    Chinese Acad Sci Tech Inst Phys & Chem Key Lab Photochem Convers & Optoelect Mat Beijing 100190 Peoples R China|Univ Chinese Acad Sci Ctr Mat Sci & Optoelect Engn Beijing 100190 Peoples R China;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    alkali etching strategy; layered double hydroxide; exposed active sites; nitrogen photofixation;

    机译:碱蚀刻策略;层状双氢氧化物;暴露的活性位点;氮气光映射;

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