Thin HfxZr1-xO2 Films: A New Lead-Free System for Electrostatic Supercapacitors with Large Energy Storage Density and Robust Thermal Stability

著录项

• 来源
  《Advanced energy materials》 |2014年第16期|1-7|共7页
• 作者

  Min Hyuk Park; Han Joon Kim; Yu Jin Kim; Taehwan Moon; Keum Do Kim; Cheol Seong Hwang;

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• 作者单位

  Department of Materials Science Engineering and Inter-university Semiconductor Research Center College of Engineering Seoul National University Seoul Republic of Korea;

  Department of Materials Science Engineering and Inter-university Semiconductor Research Center College of Engineering Seoul National University Seoul Republic of Korea;

  Department of Materials Science Engineering and Inter-university Semiconductor Research Center College of Engineering Seoul National University Seoul Republic of Korea;

  Department of Materials Science Engineering and Inter-university Semiconductor Research Center College of Engineering Seoul National University Seoul Republic of Korea;

  Department of Materials Science Engineering and Inter-university Semiconductor Research Center College of Engineering Seoul National University Seoul Republic of Korea;

  Department of Materials Science Engineering and Inter-university Semiconductor Research Center College of Engineering Seoul National University Seoul Republic of Korea;

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• 原文格式 PDF
• 正文语种 eng
• 中图分类
• 关键词

  energy storage; supercapacitors; antiferroelectric materials; HfxZr1-xO2; atomic layer deposition;

  机译：储能;超级电容器;反电材料;HfxZr1-xO2;原子层沉积;