机译:MoS_2-石墨烯横向异质结构的改善的电接触性能
Korea Adv Inst Sci & Technol, Sch Elect Engn, Ctr Adv Mat Discovery 3D Displays, Graphene 2D Mat Res Ctr, 291 Daehak Ro, Daejeon 34141, South Korea;
Korea Adv Inst Sci & Technol, Sch Elect Engn, Ctr Adv Mat Discovery 3D Displays, Graphene 2D Mat Res Ctr, 291 Daehak Ro, Daejeon 34141, South Korea;
Korea Adv Inst Sci & Technol, Sch Elect Engn, Ctr Adv Mat Discovery 3D Displays, Graphene 2D Mat Res Ctr, 291 Daehak Ro, Daejeon 34141, South Korea;
Korea Adv Inst Sci & Technol, Sch Elect Engn, Ctr Adv Mat Discovery 3D Displays, Graphene 2D Mat Res Ctr, 291 Daehak Ro, Daejeon 34141, South Korea;
Korea Adv Inst Sci & Technol, Sch Elect Engn, Ctr Adv Mat Discovery 3D Displays, Graphene 2D Mat Res Ctr, 291 Daehak Ro, Daejeon 34141, South Korea;
chemical vapor deposition; contact resistance; graphene; lateral heterostructure; MoS2;
机译:不同边缘触点对蓝磷酸亚苯侧异质结构的光催化和光学性质的影响
机译:Algan / GaN异质结构上钨碳化钨梭触头电气和结构性能的热退火效应
机译:不同质量的AlGaN / GaN异质结构上基于Ti / Al的接触的电和结构性质
机译:尖端诱导应变对MOS_2-石墨烯杂交纳米级电性能的影响
机译:金/砷化镓电触头的冶金和电学性能
机译:硅基异质结构纳米线的受控生长及其结构和电性能
机译:完全封装的超薄黑色的电学特性 具有石墨烯接触的磷基异质结构
机译:开发改进的GaN电触点的理论和实验方法