机译:范德华绝缘材料之间的界面处的导电
Univ Tokyo, Quantum Phase Elect Ctr, Bunkyo Ku, 7-3-1 Hongo, Tokyo 1138656, Japan|Univ Tokyo, Dept Appl Phys, Bunkyo Ku, 7-3-1 Hongo, Tokyo 1138656, Japan;
Univ Tokyo, Quantum Phase Elect Ctr, Bunkyo Ku, 7-3-1 Hongo, Tokyo 1138656, Japan|Univ Tokyo, Dept Appl Phys, Bunkyo Ku, 7-3-1 Hongo, Tokyo 1138656, Japan|RIKEN, CEMS, 2-1 Hirosawa, Wako, Saitama 3510198, Japan;
Univ Tokyo, Quantum Phase Elect Ctr, Bunkyo Ku, 7-3-1 Hongo, Tokyo 1138656, Japan|Univ Tokyo, Dept Appl Phys, Bunkyo Ku, 7-3-1 Hongo, Tokyo 1138656, Japan;
Univ Tokyo, Quantum Phase Elect Ctr, Bunkyo Ku, 7-3-1 Hongo, Tokyo 1138656, Japan|Univ Tokyo, Dept Appl Phys, Bunkyo Ku, 7-3-1 Hongo, Tokyo 1138656, Japan;
Univ Tokyo, Quantum Phase Elect Ctr, Bunkyo Ku, 7-3-1 Hongo, Tokyo 1138656, Japan|Univ Tokyo, Dept Appl Phys, Bunkyo Ku, 7-3-1 Hongo, Tokyo 1138656, Japan;
Univ Tokyo, Quantum Phase Elect Ctr, Bunkyo Ku, 7-3-1 Hongo, Tokyo 1138656, Japan|Univ Tokyo, Dept Appl Phys, Bunkyo Ku, 7-3-1 Hongo, Tokyo 1138656, Japan|RIKEN, CEMS, 2-1 Hirosawa, Wako, Saitama 3510198, Japan;
2D materials; interface charge transfer; molecular-beam epitaxy; transition-metal dichalcogenide; van der Waals heterostructures;
机译:范德华相互作用下导热,电绝缘材料的导热系数预测
机译:用Quasi-1D范德瓦尔斯填充物在GHz和子THz频带中的高效电磁屏蔽,电绝缘柔性薄膜
机译:拓扑绝缘子Bi
机译:通过范德华兹界面剥落Ⅲ-Ⅴ覆盖层的(IN_XGA_(1-X))_ 2SE_3缓冲材料的生长
机译:铁电薄膜和二维范德华材料的扫描探针显微镜和电传输研究
机译:范德沃尔斯异质结构 - 用于清洁能源应用的电极材料的最新进展
机译:范德瓦尔斯拓扑绝缘体的外延生长 Bi $ _ {2-x} $ sb $ _x $ Te $ _ {3-y} $ se $ _y $ ultrathin nanoplate on electrical 绝缘氟金云母