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首页> 外文期刊>Advanced Functional Materials >A Multibeam Interference Model for Analyzing Complex Near-Field Images of Polaritons in 2D van der Waals Microstructures
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A Multibeam Interference Model for Analyzing Complex Near-Field Images of Polaritons in 2D van der Waals Microstructures

机译：用于分析二维范德华微观结构中极化子的复杂近场图像的多光束干涉模型

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摘要

Van der Waals (vdW) materials are among the most promising candidates for photonic integrated circuits because they support a full set of polaritons that can manipulate light at deep subdiffraction nanoscale. It is possible to directly probe the propagating polaritons in vdW materials in real space via scattering-type scanning near-field optical microscopy, such that the wave vector and lifetime of the polaritons can be extracted from as-measured interference fringes by Fourier analysis. However, this method is unsuitable for clutter interference patterns in samples exhibiting inadequate fringes due to small size (less than 10 mu m) or complex edges that are often encountered in nanophotonic devices and new material characterization. Here, a multibeam interference model is developed to analyze complex images by disentangling them into periodic patterns and residue. By employing phase stationary approximation, polariton wave vector can be derived from offset ratio of the center point, and the ratio of polariton reflection and scattering rates at the edge is obtained from the ratio of the periodic and aperiodic patterns. This method can be widely used in the optical characterization of new vdW materials that are difficult to synthesize into large crystals, as well as nanophotonic integrated devices with unique boundaries.
机译：范德华（vdW）材料是光子集成电路最有希望的候选材料之一，因为它们支持全套极化子，这些极化子可以操纵深亚衍射纳米级的光。可以通过散射型扫描近场光学显微镜在真实空间中直接探测vdW材料中正在传播的极化子，从而可以通过傅立叶分析从被测干涉条纹中提取极化子的波矢量和寿命。然而，由于纳米光子器件经常遇到的小尺寸（小于10微米）或复杂的边缘以及新材料的表征，该方法不适用于显示条纹不足的样品中的杂波干涉图样。在这里，开发了一种多光束干涉模型，通过将复杂图像分解为周期性图案和残差来分析它们。通过采用相位平稳近似，可以从中心点的偏移率得出极化波矢量，并且从周期图和非周期性图样的比率获得边缘处的极化子反射率和散射率。该方法可广泛用于难以合成为大晶体的新型vdW材料的光学表征，以及具有独特边界的纳米光子集成器件。

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