• 主题
高级搜索  >
历史搜索 清空历史
首页> 外文期刊>Advanced Functional Materials >Design of Strain-Limiting Substrate Materials for Stretchable and Flexible Electronics
【24h】

Design of Strain-Limiting Substrate Materials for Stretchable and Flexible Electronics

机译：伸缩性和柔性电子的有限应变基片材料设计

获取原文
获取原文并翻译 | 示例
           
页面导航
  • 摘要
  • 著录项
  • 相似文献
  • 相关主题

摘要

Recently developed classes of electronics for biomedical applications exploit substrates that offer low elastic modulus and high stretchability, to allow intimate, mechanically biocompatible integration with soft biological tissues. A challenge is that such substrates do not generally offer protection of the electronics from high peak strains that can occur upon large-scale deformation, thereby creating a potential for device failure. The results presented here establish a simple route to compliant substrates with strain-limiting mechanics based on approaches that complement those of recently described alternatives. Here, a thin film or mesh of a high modulus material transferred onto a prestrained compliant substrate transforms into wrinkled geometry upon release of the prestrain. The structure formed by this process offers a low elastic modulus at small strain due to the small effective stiffness of the wrinkled film or mesh; it has a high tangent modulus (e.g., > 1000 times the elastic modulus) at large strain, as the wrinkles disappear and the film/mesh returns to a flat geometry. This bilinear stress-strain behavior has an extremely sharp transition point, defined by the magnitude of the prestrain. A theoretical model yields analytical expressions for the elastic and tangent moduli and the transition strain of the bilinear stress-strain relation, with quantitative correspondence to finite element analysis and experiments.
机译：最近开发的用于生物医学应用的电子产品类别利用提供低弹性模量和高拉伸性的基材，以允许与软生物组织进行紧密的机械生物相容性整合。一个挑战是，这样的基板通常不能为电子器件提供保护，使其免受大规模变形时可能发生的高峰值应变的影响，从而可能导致器件故障。此处提出的结果基于与最近描述的替代方法互补的方法，建立了具有应变限制机制的顺应性基板的简单方法。在此，在释放预应变时，转移到预应变的柔性基底上的高模量材料的薄膜或网状物转变为起皱的几何形状。通过这种方法形成的结构由于起皱的薄膜或网眼的有效刚度小而在小应变下提供了低弹性模量。它在大应变下具有高的切线模量（例如> 1000倍于弹性模量），因为皱纹消失了，薄膜/网眼恢复了平坦的几何形状。这种双线性应力-应变行为具有一个非常尖锐的过渡点，该过渡点由预应变的大小定义。一个理论模型可以得出双线性应力-应变关系的弹性和正切模量以及过渡应变的解析表达式，并与有限元分析和实验定量对应。

著录项

  • 来源
    《Advanced Functional Materials》 |2016年第29期|5345-5351|共7页
  • 作者

    Ma Yinji; Jang Kyung-In; Wang Liang; Jung Han Na; Kwak Jean Won; Xue Yeguang; Chen Hang; Yang Yiyuan; Shi Dawei; Feng Xue; Rogers John A.; Huang Yonggang;

  • 作者单位

    Northwestern Univ, Dept Civil & Environm Engn, Evanston, IL 60208 USA|Northwestern Univ, Dept Mech Engn, Evanston, IL 60208 USA|Northwestern Univ, Dept Mat Sci, Evanston, IL 60208 USA|Tsinghua Univ, Dept Engn Mech, Ctr Mech & Mat, Beijing 100084, Peoples R China;

    Univ Illinois, Dept Mat Sci & Engn, Urbana, IL 61801 USA|Univ Illinois, Frederick Seitz Mat Res Lab, Urbana, IL 61801 USA;

    Northwestern Univ, Dept Civil & Environm Engn, Evanston, IL 60208 USA|Northwestern Univ, Dept Mech Engn, Evanston, IL 60208 USA|Northwestern Univ, Dept Mat Sci, Evanston, IL 60208 USA|Zhejiang Univ, Dept Chem & Biol Engn, Inst Chem Machinery & Proc Equipment, Hangzhou 310027, Zhejiang, Peoples R China;

    Univ Illinois, Dept Mat Sci & Engn, Urbana, IL 61801 USA|Univ Illinois, Frederick Seitz Mat Res Lab, Urbana, IL 61801 USA;

    Univ Illinois, Dept Mat Sci & Engn, Urbana, IL 61801 USA|Univ Illinois, Frederick Seitz Mat Res Lab, Urbana, IL 61801 USA;

    Northwestern Univ, Dept Civil & Environm Engn, Evanston, IL 60208 USA|Northwestern Univ, Dept Mech Engn, Evanston, IL 60208 USA|Northwestern Univ, Dept Mat Sci, Evanston, IL 60208 USA;

    Northwestern Univ, Dept Civil & Environm Engn, Evanston, IL 60208 USA|Northwestern Univ, Dept Mech Engn, Evanston, IL 60208 USA|Northwestern Univ, Dept Mat Sci, Evanston, IL 60208 USA|Tsinghua Univ, Dept Engn Mech, Ctr Mech & Mat, Beijing 100084, Peoples R China;

    Univ Illinois, Dept Mat Sci & Engn, Urbana, IL 61801 USA|Univ Illinois, Frederick Seitz Mat Res Lab, Urbana, IL 61801 USA;

    Univ Illinois, Dept Mat Sci & Engn, Urbana, IL 61801 USA|Univ Illinois, Frederick Seitz Mat Res Lab, Urbana, IL 61801 USA;

    Tsinghua Univ, Dept Engn Mech, Ctr Mech & Mat, Beijing 100084, Peoples R China;

    Univ Illinois, Beckman Inst Adv Sci & Technol, Dept Mat Sci & Engn, Urbana, IL 61801 USA|Univ Illinois, Beckman Inst Adv Sci & Technol, Dept Chem, Urbana, IL 61801 USA|Univ Illinois, Beckman Inst Adv Sci & Technol, Dept Mech Sci, Urbana, IL 61801 USA|Univ Illinois, Beckman Inst Adv Sci & Technol, Dept Engn Elect & Comp Engn, Urbana, IL 61801 USA|Univ Illinois, Frederick Seitz Mat Res Lab, Urbana, IL 61801 USA;

    Northwestern Univ, Dept Civil & Environm Engn, Evanston, IL 60208 USA|Northwestern Univ, Dept Mech Engn, Evanston, IL 60208 USA|Northwestern Univ, Dept Mat Sci, Evanston, IL 60208 USA;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱：kefu@zhangqiaokeyan.com

京公网安备：11010802029741号 ICP备案号：京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有

  • 客服微信

  • 服务号