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Profile Control in Block Copolymer Nanostructures using Bilayer Thin Films for Enhanced Pattern Transfer Processes

机译:使用双层薄膜的嵌段共聚物纳米结构中的轮廓控制,用于增强的图案转移工艺

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摘要

Although control over the domain orientation and long-range order of block copolymer nanostructures self-assembled in thin films has been achieved using various directed self-assembly techniques, more challenging but equally important for many lithographic applications is the ability to precisely control the shape of the interface between domains. Here, a novel layer-by-layer approach is reported for controlling the interface profile of block copolymer nanostructures and the application of an undercut sidewall profile for an enhanced metal lift-off process for pattern transfer is demonstrated. Bilayer films of lamellar-forming poly(styrene-block-methyl methacrylate) are assembled and thermally cross-linked on wafer substrates in a layer-by-layer process. The top layer, while being directed to self-assemble on the lamellae of the underlying layer, has a tunable composition and polystyrene domain width independent of that of the bottom layer. Undercut or negative sidewall profiles in the PS nanostructures are proven to provide better templates for the lift-off of Au nanowires by achieving complete and defect-free pattern transfer more than three times faster than comparable systems with vertical sidewall profiles. More broadly, the layer-by-layer approach presented here provides a pathway to achieving sophisticated interface profiles and user-defined 3D block copolymer nanostructures in thin films.
机译:尽管已经使用各种定向自组装技术实现了对嵌段共聚物纳米结构在薄膜中自组装的域取向和长程顺序的控制,但对于许多光刻应用而言,更具挑战性但同等重要的是精确控制薄膜形状的能力。域之间的接口。在这里,报道了一种新颖的逐层方法,用于控制嵌段共聚物纳米结构的界面轮廓,并证明了底切侧壁轮廓在增强金属剥离工艺中进行图案转移的应用。层状形成的聚(苯乙烯嵌段-甲基丙烯酸甲酯)的双层膜被组装并以逐层工艺在晶片衬底上热交联。顶层被定向为在下面层的薄片上自组装,但其可调谐组成和聚苯乙烯畴宽度与底层的宽度无关。事实证明,与具有垂直侧壁轮廓的同类系统相比,PS纳米结构中的底切或负侧壁轮廓可以实现完整且无缺陷的图案转移,速度要快三倍以上,从而可以为金纳米线的剥离提供更好的模板。更广泛地说,此处介绍的逐层方法提供了一种在薄膜中实现复杂的界面轮廓和用户定义的3D嵌段共聚物纳米结构的途径。

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  • 来源
    《Advanced Functional Materials》 |2014年第45期|7078-7084|共7页
  • 作者

    Chunlin He; Mark P. Stoykovich;

  • 作者单位

    Department of Chemical and Biological Engineering University of Colorado at Boulder Boulder, CO 80309, USA;

    Department of Chemical and Biological Engineering University of Colorado at Boulder Boulder, CO 80309, USA;

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  • 正文语种 eng
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