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首页> 外文期刊>Advanced Functional Materials >Evaluating the Critical Thickness of TiO_2 Layer on Insulating Mesoporous Templates for Efficient Current Collection in Dye-Sensitized Solar Cells
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Evaluating the Critical Thickness of TiO_2 Layer on Insulating Mesoporous Templates for Efficient Current Collection in Dye-Sensitized Solar Cells

机译：评估染料敏化太阳能电池中有效收集电流的绝缘介孔模板上TiO_2层的临界厚度

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摘要

In this paper, a way of utilizing thin and conformal overlayer of titanium dioxide on an insulating mesoporous template as a photoanode for dye-sensitized solar cells is presented. Different thicknesses of TiO_2 ranging from 1 to 15 nm are deposited on the surface of the template by atomic layer deposition. This systematic study helps unraveling the minimum critical thickness of the TiO_2 overlayer required to transport the photogenerated electrons efficiently. A merely 6-nm-thick TiO_2 film on a 3-μm mesoporous insulating substrate is shown to transport 8 mA/cm~2 of photocurrent density along with ≈900 mV of open-circuit potential when using our standard donor-π-acceptor sensitizer and Co(bipyridine) redox mediator.
机译：本文提出了一种利用绝缘介孔模板上的薄而保形的二氧化钛覆盖层作为染料敏化太阳能电池的光阳极的方法。通过原子层沉积在模板的表面上沉积厚度范围为1至15 nm的TiO_2。这项系统的研究有助于揭示有效传输光生电子所需的TiO_2覆盖层的最小临界厚度。当使用我们的标准施主-π-受体敏化剂时，在3μm介孔绝缘基板上仅6nm厚的TiO_2膜显示出8mA / cm〜2的光电流密度和≈900mV的开路电位。和Co（联吡啶）氧化还原介体。

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  • 来源
    《Advanced Functional Materials》 |2013年第21期|2775-2781|共7页
  • 作者

    Aravind Kumar Chandiran; Pascal Comte; Robin Humphry-Baker; Florian Kessler; Chenyi Yi; Md. Khaja Nazeeruddin; Michael Graetzel;

  • 作者单位

    Laboratory of Photonics and Interfaces Institute of Chemical Sciences and Engineering Swiss Federal Institute of Technology (EPFL) Station 6, 1015 Lausanne, Switzerland;

    Laboratory of Photonics and Interfaces Institute of Chemical Sciences and Engineering Swiss Federal Institute of Technology (EPFL) Station 6, 1015 Lausanne, Switzerland;

    Laboratory of Photonics and Interfaces Institute of Chemical Sciences and Engineering Swiss Federal Institute of Technology (EPFL) Station 6, 1015 Lausanne, Switzerland;

    Laboratory of Photonics and Interfaces Institute of Chemical Sciences and Engineering Swiss Federal Institute of Technology (EPFL) Station 6, 1015 Lausanne, Switzerland Siemens AG, Corporate Technology, CT RTC MAT MPV, Guenther-Scharowsky Strasse 1, D-91058 Erlangen, Germany;

    Laboratory of Photonics and Interfaces Institute of Chemical Sciences and Engineering Swiss Federal Institute of Technology (EPFL) Station 6, 1015 Lausanne, Switzerland;

    Laboratory of Photonics and Interfaces Institute of Chemical Sciences and Engineering Swiss Federal Institute of Technology (EPFL) Station 6, 1015 Lausanne, Switzerland;

    Laboratory of Photonics and Interfaces Institute of Chemical Sciences and Engineering Swiss Federal Institute of Technology (EPFL) Station 6, 1015 Lausanne, Switzerland;

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