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首页> 外文期刊>Advanced Functional Materials >Controlling the Degree of Crystallinity and Preferred Crystallographic Orientation in Poly-Perfluorodecylacrylate Thin Films by Initiated Chemical Vapor Deposition
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Controlling the Degree of Crystallinity and Preferred Crystallographic Orientation in Poly-Perfluorodecylacrylate Thin Films by Initiated Chemical Vapor Deposition

机译：通过引发化学气相沉积控制聚全氟癸基丙烯酸酯薄膜的结晶度和优选的晶体学取向

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摘要

Preferred crystallographic orientation (texture) in thin films of technologically important materials frequently has a strong effect on the properties of these films and is important for stable surface properties. The deposition of organized molecular films of a poly-perfluorodecylacrylate, poly-(1 H,1 H,2H,2H-perfluorodecyl acrylate) (p-PFDA), by initiated chemical vapor deposition (iCVD) is described. The tendency of p-PFDA to crystallize in a smectic B phase has been reported in films prepared from solution but not for those using a CVD technique. The degree of crystallinity and the preferred orientation of the perfluoro side chains, either parallel or perpendicular to the surface, are controlled by tuning the CVD process parameters (i.e., initiator to monomer flow rate ratio, filament temperature, and substrate temperature). Films with no observable X-ray diffraction patterns are also achieved. The observed differences in crystal texture strongly impact the observed water contact angles (150° to 130°, advancing) and corresponding hysteresis behavior. Low hysteresis (<7°) is associated with high crystallinity, particularly when the orientation of the crystallites resulted in the perfluoro side groups being oriented parallel to the surface. The latter texture resulted in smoother film than the texture with the chains oriented perpendicular to the surface and this can be very advantageous for applications in which relatively smooth but still crystalline films are needed.
机译：具有技术重要性的材料的薄膜中优选的晶体学取向（织构）通常会对这些薄膜的性能产生强烈影响，并且对于稳定的表面性能也很重要。描述了通过引发化学气相沉积（iCVD）沉积的聚全氟丙烯酸丙烯酸酯，聚-（1 H，1 H，2H，2H-全氟丙烯酸丙烯酸酯）（p-PFDA）的有序分子膜。从溶液制备的薄膜中已经报道了p-PFDA在近晶B相中结晶的趋势，但是对于使用CVD技术的薄膜却没有报道。平行于或垂直于表面的全氟侧链的结晶度和优选取向通过调节CVD工艺参数（即，引发剂与单体的流量比，细丝温度和基材温度）来控制。还获得了没有可观察到的X射线衍射图的膜。观察到的晶体织构差异强烈影响观察到的水接触角（150°至130°，前进）和相应的滞后行为。低滞后（<7°）与高结晶度有关，特别是当微晶的取向导致全氟侧基平行于表面取向时。与具有垂直于表面取向的链的质地相比，后一种质地产生的膜更光滑，这对于需要相对光滑但仍结晶的膜的应用来说可能是非常有利的。

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  • 来源
    《Advanced Functional Materials》 |2012年第10期|p.2167-2176|共10页
  • 作者

    Anna Maria Coclite; Yujun Shi; Karen K. Gleason;

  • 作者单位

    Department of Chemical Engineering Massachusetts Institute of Technology Cambridge, MA 02139, USA;

    Department of Chemistry University of Calgary Calgary, Alberta, Canada;

    Department of Chemical Engineering Massachusetts Institute ofTechnology Cambridge, MA 02139, USA;

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