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Nanoparticle/Dye Interface Optimization in Dye-Sensitized Solar Cells

机译:染料敏化太阳能电池中的纳米颗粒/染料界面优化

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摘要

A critical component in the development of highly efficient dye-sensitized solar cells is the interface between the ruthenium bipyridyl complex dye and the surface of the mesoporous titanium dioxide film. In spite of many studies aimed at examining the detailed anchoring mechanism of the dye on the titania surface, there is as yet no commonly accepted understanding. Furthermore, it is generally believed that a single monolayer of strongly attached molecules is required in order to maximize the efficiency of electron injection into the semiconductor. In this study, the amount of adsorbed dye on the mesoporous film is maximised, which in turn increases the light absorption and decreases carrier recombination, resulting in improved device performance. A process that increases the surface concentration of the dye molecules adsorbed on the TiO_2 surface by up to 20% is developed. This process is based on partial desorption of the dye after the initial adsorption, followed by readsorption. This desorption/adsorption cycling process can be repeated multiple times and yields a continual increase in dye uptake, up to a saturation limit. The effect on device performance is directly related and a 23% increase in power conversion efficiency is observed. Surface enhanced Raman spectroscopy, infrared spectroscopy, and electrochemical impedance analysis were used to elucidate the fundamental mechanisms behind this observation.
机译:高效染料敏化太阳能电池开发中的关键组件是钌联吡啶基络合物染料与中孔二氧化钛薄膜表面之间的界面。尽管进行了许多旨在研究染料在二氧化钛表面上的详细锚固机理的研究,但目前尚无公认的理解。此外,通常认为需要单个单层的牢固连接的分子以使电子注入半导体的效率最大化。在这项研究中,最大程度地吸附了中孔膜上的染料,从而增加了光吸收并减少了载流子复合,从而改善了器件性能。开发了一种将吸附在TiO_2表面上的染料分子的表面浓度提高多达20%的方法。该过程基于染料在初始吸附后部分解吸,然后再吸附。此解吸/吸附循环过程可以重复多次,并持续增加染料吸收,直至达到饱和极限。对器件性能的影响直接相关,并且观察到功率转换效率提高了23%。使用表面增强拉曼光谱,红外光谱和电化学阻抗分析来阐明该观察背后的基本机理。

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  • 来源
    《Advanced Functional Materials》 |2011年第17期|p.3268-3274|共7页
  • 作者单位

    Materials & Manufacturing Directorate Air Force Research Laboratory Wright-Patterson Air Force Base, OH 45433, USA;

    Universal Technology Corporation Dayton, OH 45432, USA;

    Universal Technology Corporation Dayton, OH 45432, USA;

    Universal Technology Corporation Dayton, OH 45432, USA;

    Materials & Manufacturing Directorate Air Force Research Laboratory Wright-Patterson Air Force Base, OH 45433, USA;

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