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首页> 外文期刊>Advanced Functional Materials >Fabrication of Ordered Nanostructured Arrays Using Poly(dimethylsiloxane) Replica Molds Based on Three-Dimensional Colloidal Crystals
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Fabrication of Ordered Nanostructured Arrays Using Poly(dimethylsiloxane) Replica Molds Based on Three-Dimensional Colloidal Crystals

机译：使用基于三维胶体晶体的聚（二甲基硅氧烷）复制模具制造有序的纳米结构的阵列。

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摘要

Hexagonally arrayed structures of colloidal crystals with uniform surface are a good candidate for master molds to be used in soft lithography. Here, the fabrication of periodically arrayed nanostructures using poly(dimethylsiloxane) (PDMS) molds based on three-dimensionally (3D) ordered colloidal crystals is reported. A robust, high-quality 3D colloidal-crystaj master molds is prepared using the colloidal suspension containing a water-soluble polymer. The surface patterns of the 3D colloidal crystals can then be transferred onto a polymer film via soft lithography, by means of the replication of the surface pattern with PDMS. Various hexagonally arrayed nanostructure patterns can be fabricated, including dose-packed and non-close-packed 2D arrays and honeycomb structures by the structural modification of the 3D colloidal-crystal templates. The replicated hexagonally arrayed structures can also be used as templates for producing colloidal crystals with 2D superlattices.
机译：具有均匀表面的胶体晶体的六边形排列结构是用于软光刻的母模的良好选择。在此，报道了使用基于三维（3D）有序胶体晶体的聚（二甲基硅氧烷）（PDMS）模具制造周期性排列的纳米结构。使用包含水溶性聚合物的胶体悬浮液，可以制备出坚固，高质量的3D胶体晶体主模具。然后可以通过用PDMS复制表面图案，通过软光刻将3D胶体晶体的表面图案转移到聚合物膜上。通过3D胶体晶体模板的结构修饰，可以制造出各种六边形排列的纳米结构图案，包括剂量填充和非紧密填充的2D阵列以及蜂窝结构。复制的六边形排列的结构也可以用作生产具有2D超晶格的胶体晶体的模板。

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  • 来源
    《Advanced Functional Materials》 |2009年第10期|1594-1600|共7页
  • 作者

    Hong Kyoon Choi; Mun Ho Kim; Sang Hyuk Im; O Ok Park;

  • 作者单位

    Department of Chemical & Biomolecular Engineering (BK 21 Graduate Program) Korea Advanced Institute of Science and Technology 373-1 Guseong-dong, Yuseong-gu Daejeon, 305-701 (Republic of Korea);

    Research Park, LG Chem, Ltd. 104-1, Moonji-dong, Yuseong-gu Daejeon 305-380 (Republic of Korea);

    Research Park, LG Chem, Ltd. 104-1, Moonji-dong, Yuseong-gu Daejeon 305-380 (Republic of Korea);

    Department of Chemical & Biomolecular Engineering (BK 21 Graduate Program) Korea Advanced Institute of Science and Technology 373-1 Guseong-dong, Yuseong-gu Daejeon, 305-701 (Republic of Korea);

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