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Formation of metal nano- and micropatterns on self-assembled monolayers by pulsed laser deposition through nanostencils and electroless deposition

机译:通过纳米模板的脉冲激光沉积和化学沉积在自组装单分子膜上形成金属纳米和微图案

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摘要

Patterns of noble-metal structures on top of self-assembled monolayers (SAMs) on Au and SiO2 substrates have been prepared following two approaches. The first approach consists of pulsed laser deposition (PLD) of Pt, Pd, Au, or Cu through nano- and microstencils. In the second approach, noble-metal cluster patterns deposited through nano- and microstencils are used as catalysts for selective electroless deposition (ELD) of Cu. Cu structures are grown on SAMs on both Au and SiO2 substrates and are subsequently analyzed using X-ray photoelectron spectroscopy element mapping, atomic force microscopy, and optical microscopy. The combination of PLD through stencils on SAMs followed by ELD is a new method for the creation of (sub)-micrometer-sized metal structures on top of SAMs. This method minimizes the gas-phase deposition step, which is often responsible for damage to, or electrical shorts through, the SAM.
机译:按照以下两种方法,已经在Au和SiO2衬底上的自组装单分子膜(SAMs)顶部形成了贵金属结构的图案。第一种方法包括通过纳米和微模板对Pt,Pd,Au或Cu进行脉冲激光沉积(PLD)。在第二种方法中,通过纳米和微模板沉积的贵金属团簇图案被用作催化剂用于铜的选择性化学沉积(ELD)。 Cu结构生长在金和SiO2衬底上的SAM上,随后使用X射线光电子能谱元素图,原子力显微镜和光学显微镜进行分析。通过SAM上的模板进行PLD组合,然后进行ELD,是在SAM上创建(亚)微米尺寸金属结构的新方法。这种方法可以最大程度地减少气相沉积步骤,而气相沉积步骤通常会导致SAM损坏或发生短路。

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