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首页> 外文期刊>Advanced Materials for Optics and Electronics >IR and UV Laser-assisted Deposition from Titanium Tetrachloride: a Comparative Study
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IR and UV Laser-assisted Deposition from Titanium Tetrachloride: a Comparative Study

机译：四氯化钛的红外和紫外激光辅助沉积：比较研究

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摘要

Laser-induced TiCl_4 decomposition at vapour pressure was performed and comparative study of the composition and structure of thermally (at 10.6 μm) and photolytically (at 248 nm) deposited Ti-based films is presented. Emphasis was given to the less explored titanium deposition process by CO_2 laser pyrolysis of TiCl_4. The detailed structure of films deposited on quartz substrates was examined by scanning electron microscopy and X-ray photoelectron spectroscopy. The influence of the Incident laser energy on the chemical content of the films as well as on the film growth rate was demonstrated. The results indicate that in the thermal IR decomposition of TiCl_4 a multilayer structure is formed with unsaturated TiSi_x at the interface and oxidized phases at the surface. The photolytic process leads to films with increased purity and a specific growth morphology.
机译：进行了激光诱导的蒸气压下的TiCl_4分解，并进行了热沉积Ti基薄膜（10.6μm）和光解（248 nm）的组成和结构的比较研究。重点是通过TiCl_4的CO_2激光热解较少探索的钛沉积过程。通过扫描电子显微镜和X射线光电子能谱检查沉积在石英衬底上的膜的详细结构。证明了入射激光能量对薄膜的化学含量以及薄膜生长速率的影响。结果表明，在热红外分解TiCl_4时，形成了多层结构，在界面处有不饱和的TiSi_x，在表面有氧化相。光解过程导致膜的纯度提高，并具有特定的生长形态。

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