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机译:静电调谐多体效应在含氟聚合物基板上的单层MoS2和WS2的工程带隙
Natl Univ Singapore, Dept Chem, 3 Sci Dr 3, Singapore 117543, Singapore|Natl Univ Singapore, Ctr Adv Mat 2D, 6 Sci Dr 2, Singapore 117546, Singapore|Natl Univ Singapore, Graphene Res Ctr, 6 Sci Dr 2, Singapore 117546, Singapore;
Natl Univ Singapore, Ctr Adv Mat 2D, 6 Sci Dr 2, Singapore 117546, Singapore|Natl Univ Singapore, Graphene Res Ctr, 6 Sci Dr 2, Singapore 117546, Singapore|Natl Univ Singapore, Dept Phys, 2 Sci Dr 3, Singapore 117542, Singapore;
Natl Univ Singapore, Dept Chem, 3 Sci Dr 3, Singapore 117543, Singapore|Shenzhen Univ, Coll Optoelect Engn, SZU NUS Collaborat Innovat Ctr Optoelect Sci & Te, Key Lab Optoelect Devices & Syst,Minist Educ & Gu, Shenzhen 518060, Peoples R China;
Natl Univ Singapore, Dept Phys, 2 Sci Dr 3, Singapore 117542, Singapore;
Natl Univ Singapore, Dept Chem, 3 Sci Dr 3, Singapore 117543, Singapore|Natl Univ Singapore, Ctr Adv Mat 2D, 6 Sci Dr 2, Singapore 117546, Singapore|Natl Univ Singapore, Graphene Res Ctr, 6 Sci Dr 2, Singapore 117546, Singapore;
Natl Univ Singapore, Dept Phys, 2 Sci Dr 3, Singapore 117542, Singapore;
Natl Univ Singapore, Dept Chem, 3 Sci Dr 3, Singapore 117543, Singapore;
Natl Univ Singapore, Dept Chem, 3 Sci Dr 3, Singapore 117543, Singapore|Natl Univ Singapore, Ctr Adv Mat 2D, 6 Sci Dr 2, Singapore 117546, Singapore|Natl Univ Singapore, Graphene Res Ctr, 6 Sci Dr 2, Singapore 117546, Singapore|Natl Univ Singapore, Dept Phys, 2 Sci Dr 3, Singapore 117542, Singapore;
Natl Univ Singapore, Dept Chem, 3 Sci Dr 3, Singapore 117543, Singapore|Natl Univ Singapore, Ctr Adv Mat 2D, 6 Sci Dr 2, Singapore 117546, Singapore|Natl Univ Singapore, Graphene Res Ctr, 6 Sci Dr 2, Singapore 117546, Singapore;
机译:多体和自旋轨道对应变单层MoS2和WS2的直接-间接带隙跃迁的影响
机译:MOS2 / MX2(MX2 = WS2,MOSE2和WSE2)的带隙工程,经受双轴应变和正常压缩菌株的异质层
机译:通过单层MoS2 / WS2的半导体相和金属相之间的相变来调节电子性能
机译:MOS2和WS2 TMDC单层使用Octonacci和Pell缺陷准光子晶体的超窄带光学吸收
机译:通过高温和空间分辨拉曼散射和光致发光研究了基底对2D材料,石墨烯,MoS2,WS2和黑磷的影响。
机译:单层MOS2的带隙工程和近红外-II光学性质:第一原理研究
机译:单层WS2,MoS2和WS2 / MoS2异质结构中的应变工程