...
首页> 外文期刊>Advanced Materials >Fabrication of Highly Ordered Silicon Oxide Dots and Stripes from Block Copolymer Thin Films
【24h】

Fabrication of Highly Ordered Silicon Oxide Dots and Stripes from Block Copolymer Thin Films

机译:由嵌段共聚物薄膜制备高度有序的氧化硅点和条纹

获取原文
获取原文并翻译 | 示例
           

摘要

The fabrication of nanopatterned materials has been accomplished by several methods, including self-organization of polymers, electron-beam lithography, X-ray lithography, optical lithography, and imprint lithography.Among them, the self-assembly of block copolymers (BCPs) in thin films produces arrays of uniform nanoscopic structures for the fabrication of high-density arrays of inorganic nanoscopic elements.
机译:纳米图案材料的制造已通过多种方法完成,包括聚合物的自组织,电子束光刻,X射线光刻,光学光刻和压印光刻。其中,嵌段共聚物(BCP)的自组装薄膜产生用于制造无机纳米元件的高密度阵列的均匀纳米结构的阵列。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号