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首页> 外文期刊>Advanced Materials >Fabrication of Metal Nanohole Arrays with High Aspect Ratios Using Two-Step Replication of Anodic Porous Alumina
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Fabrication of Metal Nanohole Arrays with High Aspect Ratios Using Two-Step Replication of Anodic Porous Alumina

机译：使用两步复制阳极多孔氧化铝制备高纵横比的金属纳米孔阵列

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摘要

Nanohole array structures with uniformly shaped and sized holes and nanometer-scale dimensions have attracted growing interest due to their potential applications in various types of functional nanodevices.'1"3' Anodic porous alumina, which is a typical self-organized nanohole array material formed by the anodization of Al in an acidic solution, is promising for use as a starting structure in nanofabricationJ4'5' To expand the applicability of anodic porous alumina, we have developed a replication process for preparing metal or semiconductor nanohole arrays using anodic porous alumina as a template.'6'7' In such a process, the preparation of a negative of anodic porous alumina and the subsequent formation of the positive generates metal or semiconductor hole arrays that have geometrical structures identical to anodic porous alumina. However, in the previously reported process, it is difficult to form nanohole arrays with sufficiently straight holes when the aspect ratios of the holes (depth divided by diameter) become high. Polymer nanopillars in the negative of the array cannot be maintained upright at high aspect ratios because the nanopillars are supported only by a layer at the base. In the present report, we describe a new replication process for the preparation of metal nanohole arrays with straight holes and high aspect ratios. The new process is based on the preparation of polymer pillars, both sides of which are supported by supporting layers, and therefore can be maintained upright. Such nanopillar arrays can be used as the negative for nanohole arrays with straight holes and high aspect ratios. Here, a metal nanohole array of Ni was prepared based on a process using a new negative-type polymer. Such a process yields nanohole array structures with straight holes of high aspect ratio, may be applicable for various types of materials, and broadens the scope for the potential application of nanohole arrays from ordered anodic porous alumina.
机译：具有均匀形状和大小的孔以及纳米级尺寸的纳米孔阵列结构由于其在各种类型的功能纳米器件中的潜在应用而引起了越来越多的兴趣。“ 1” 3”阳极多孔氧化铝是一种典型的自组织纳米孔阵列材料通过在酸性溶液中对铝进行阳极氧化，有望用作纳米加工的起始结构。J4'5'为了扩大阳极多孔氧化铝的适用性，我们开发了一种复制工艺，用于制备使用阳极多孔氧化铝作为金属或半导体的纳米孔阵列'6'7'在这种方法中，制备阳极多孔氧化铝的底片并随后形成正片会产生具有与阳极多孔氧化铝相同的几何结构的金属或半导体孔阵列。报告的过程中，当孔的长宽比（深度除以直径）变高。阵列负片中的聚合物纳米柱无法以高长宽比保持直立，因为纳米柱仅由底部的一层支撑。在本报告中，我们描述了一种制备具有直孔和高纵横比的金属纳米孔阵列的新复制工艺。新工艺基于聚合物支柱的制备，聚合物支柱的两侧均由支撑层支撑，因此可以保持直立。这种纳米柱阵列可以用作具有直孔和高纵横比的纳米孔阵列的底片。在此，基于使用新的负型聚合物的工艺来制备Ni的金属纳米孔阵列。这种方法产生具有高长径比的直孔的纳米孔阵列结构，可适用于各种类型的材料，并扩大了有序阳极多孔氧化铝对纳米孔阵列的潜在应用范围。

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  • 来源
    《Advanced Materials》 |2005年第18期|p. 2241-2243|共3页
  • 作者

    Takashi Yanagishita; Kazuyuki Nishio; Hide Id Masuda;

  • 作者单位

    Kanagawa Academy of Science and Technology, 5-4-30 Nishihashimoto, Sagamihara, Kanagawa 229-1131, Japan;

    Kanagawa Academy of Science and Technology, 5-4-30 Nishihashimoto, Sagamihara, Kanagawa 229-1131, Japan;

    Department of Applied Chemistry, Tokyo Metropolitan University, Minamiosawa, Hachioji, Tokyo 192-0397, Japan;

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  • 正文语种 eng
  • 中图分类 工程材料学;
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