Growth of n-type diamond semiconductor on (001)-oriented diamond substrate using microwave plasma-enhanced chemical vapor deposition (CVD) technique has been succeeded leading the world. This is a very significant achievement eliminating the restriction of substrate orientation, which has been a bottleneck in the development of diamond electronic devices. Furthermore, UV light emission has been observed with emitting device, which is made using p-n junction of the (001)-oriented diamond semiconductors.
展开▼