A Collective Laser Thomson Scattering System for Diagnostics of Laser-Produced Plasmas for Extreme Ultraviolet Light Sources

Kentaro Tomita; Kazuki Nakayama; Kazuya Inoue; Atsushi Sunahara; Kiichiro Uchino

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A Collective Laser Thomson Scattering System for Diagnostics of Laser-Produced Plasmas for Extreme Ultraviolet Light Sources

机译：用于诊断极端紫外光源产生的等离子体的集体激光汤姆森散射系统

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To develop a diagnostic system for laser-produced plasmas for extreme ultraviolet (EUV) light sources, collective laser Thomson scattering (LTS) was applied to laser-produced carbon plasmas to measure plasma parameters such as electron density (n_e) and electron temperature (T_e). Plasmas having parameters necessary for an EUV light source (n_e = 10~(24)-10~(25) m~(-3), T_e = 30-50 eV) were achieved, and these parameters were successfully evaluated by a pilot diagnostic system with errors below 10%. From these results, an LTS system for diagnostics of tin plasmas for real EUV light sources was designed.

机译：为了开发用于极端紫外线（EUV）光源的激光产生等离子体的诊断系统，将集体激光汤姆逊散射（LTS）应用于激光产生的碳等离子体，以测量等离子体参数，例如电子密度（n_e）和电子温度（T_e））。获得了具有EUV光源所需参数的等离子体（n_e = 10〜（24）-10〜（25）m〜（-3），T_e = 30-50 eV），并且通过先导诊断成功评估了这些参数系统的错误率低于10％。根据这些结果，设计了用于诊断实际EUV光源的锡等离子体的LTS系统。

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《_Applied Physics Express》 |2013年第7期|076101.1-076101.4|共4页
作者
Kentaro Tomita; Kazuki Nakayama; Kazuya Inoue; Atsushi Sunahara; Kiichiro Uchino;
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Interdisciplinary Graduate School of Engineering and Sciences, Kyushu University, Kasuga, Fukuoka 816-8580, Japan;

Interdisciplinary Graduate School of Engineering and Sciences, Kyushu University, Kasuga, Fukuoka 816-8580, Japan;

Interdisciplinary Graduate School of Engineering and Sciences, Kyushu University, Kasuga, Fukuoka 816-8580, Japan;

Institute for Laser Technology, Suita, Osaka 565-0871, Japan;

Interdisciplinary Graduate School of Engineering and Sciences, Kyushu University, Kasuga, Fukuoka 816-8580, Japan;

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1. Development of a collective Thomson scattering system for laser-produced tin plasmas for extreme-ultraviolet light sources [J] . Kentaro Tomita, Yuta Sato, Kazutaka Nishikawa, Applied physics express . 2015,第12期

机译：开发用于激光的极紫外光源锡等离子体的集体汤姆逊散射系统
2. Electron density and temperature contour plots from a laser-produced plasma using collective ultraviolet Thomson scattering [J] . Cameron S.M., Tracy M.D. IEEE Transactions on Plasma Science . 1996,第1期

机译：激光产生等离子体的电子密度和温度等高线图，使用集体紫外汤姆森散射
3. Laser-produced plasma versus laser-assisted discharge plasma: physics and technology of extreme ultraviolet lithography light sources [J] . Guido Schriever, Olivier Semprez, Jeroen Jonkers, Journal of Micro/Nanolithography, MEMS, and MOEMS . 2012,第2期

机译：激光产生的等离子体与激光辅助的放电等离子体：极紫外光刻光源的物理和技术
4. Radiative Properties and Hydrodynamics of Laser-Produced Tin Plasma for Efficient Extreme Ultraviolet Light Source [C] . S. Fujioka, H. Nishimura, K Nishihara, International X-Ray Lasers Conference . 2007

机译：高效极端紫外光源激光生产的锡等离子体的辐射性能和流体动力学
5. Emission characteristics of Nd:YAG and CO2 laser-produced tin plasmas for extreme ultraviolet lithography source development. [D] . Campos, David Daniel. 2010

机译：Nd：YAG和CO2激光产生的锡等离子体的发射特性，可用于极端紫外光刻源的开发。
6. Time-resolved two-dimensional profiles of electron density and temperature of laser-produced tin plasmas for extreme-ultraviolet lithography light sources [O] . Kentaro Tomita, Yuta Sato, Syouichi Tsukiyama, -1

机译：极紫外光刻光源的激光产生的锡等离子体的电子密度和温度的时间分辨二维分布
7. High-space resolution imaging plate analysis of extreme ultraviolet (EUV) light from tin laser-produced plasmas [O] . Christopher S. A. Musgrave, Takehiro Murakami, Teruyuki Ugomori, 2017

机译：来自锡激光产生的等离子体的极端紫外（EUV）光的高空间分辨率成像板分析

A Collective Laser Thomson Scattering System for Diagnostics of Laser-Produced Plasmas for Extreme Ultraviolet Light Sources

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