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首页> 外文期刊>Applied Physics >On the phase formation of titanium oxide thin films deposited by reactive DC magnetron sputtering: influence of oxygen partial pressure and nitrogen doping
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On the phase formation of titanium oxide thin films deposited by reactive DC magnetron sputtering: influence of oxygen partial pressure and nitrogen doping

机译：反应性直流磁控溅射沉积钛氧化物薄膜的相形成：氧分压和氮掺杂的影响

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摘要

This work describes about the control on phase formation in titanium oxide thin films deposited by reactive dc magnetron sputtering. Various phases of titanium oxide thin films were deposited by controlling the oxygen partial pressure during the sputtering process. By adding nitrogen gas to sputter gas mixture of oxygen and argon, the oxygen partial pressure was decreased further below the usual critical value, below and above which the sputtering yields metallic and oxide films, respectively. Furthermore, nitrogen addition eliminated the typical hysteretic behaviour between the flow rate and oxygen partial pressure, and significantly influenced the sputter rate. On increasing the oxygen partial pressure, the ratio between anatase and rutile fraction and grain size increases. The fracture cross-sectional scanning electron microscopy together with the complementary information from X-ray diffraction and micro-Raman investigations revealed the evolution and spatial distribution of the anatase and rutile phases. Both the energy delivered to the growing film and oxygen vacancy concentrations are correlated with the formation of various phases upon varying the oxygen partial pressure.
机译：这项工作描述了对通过反应性直流磁控溅射沉积的二氧化钛薄膜中相形成的控制。通过控制溅射过程中的氧分压来沉积各相的氧化钛薄膜。通过将氮气加入到氧气和氩气的溅射气体混合物中，氧气分压进一步降低到通常的临界值以下，在该临界值以下，溅射分别产生金属膜和氧化物膜。此外，氮的添加消除了流速和氧分压之间的典型滞后行为，并显着影响了溅射速率。随着氧分压的增加，锐钛矿和金红石级分的比例和晶粒尺寸增加。断面扫描电子显微镜以及来自X射线衍射和显微拉曼研究的补充信息揭示了锐钛矿和金红石相的演化和空间分布。在改变氧分压时，传递到生长膜的能量和氧空位浓度都与各种相的形成相关。

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  • 来源
    《Applied Physics》 |2014年第4期|1905-1913|共9页
  • 作者

    Ramanathaswamy Pandian; Gomathi Natarajan; S. Rajagopalan; M. Kamruddin; A. K. Tyagi;

  • 作者单位

    Surface and Nanoscience Division, Materials Science Group, Indira Gandhi Center for Atomic Research, Kalpakkam 603102, India;

    Surface and Nanoscience Division, Materials Science Group, Indira Gandhi Center for Atomic Research, Kalpakkam 603102, India;

    Surface and Nanoscience Division, Materials Science Group, Indira Gandhi Center for Atomic Research, Kalpakkam 603102, India;

    Surface and Nanoscience Division, Materials Science Group, Indira Gandhi Center for Atomic Research, Kalpakkam 603102, India;

    Surface and Nanoscience Division, Materials Science Group, Indira Gandhi Center for Atomic Research, Kalpakkam 603102, India;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
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  • 正文语种 eng
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