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Controllable growth and characterization of highly aligned ZnO nanocolumnar thin films

机译:高度取向的ZnO纳米柱状薄膜的可控生长和表征

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摘要

We investigated the effects of growth conditions during magnetron sputtering on the structural, morphological, and optical properties of nanostructured ZnO thin films. Undoped ZnO thin films are deposited onto p-type Si (100) and corning 7059 glass substrates by RF magnetron sputtering using a ZnO target in combination with various Ar-O-2 sputtering gas mixtures at room temperature. The effect of the partial pressure of oxygen on the morphology of ZnO thin film structure and band alignment were investigated. Thickness, and therefore the growth rate of the samples measured from the cross-sectional SEM micrographs, is found to be strongly correlated with the oxygen partial pressure in the sputtering chamber. The optical transmittance spectrometry results show that the absorption edge shifts towards the longer wavelength at higher oxygen partial pressure. X-ray photoelectron spectroscopy (XPS) used for determining the surface chemical structure and valence band offsets show that conduction band can be controlled by changing the sputtering atmosphere. (C) 2016 Elsevier B.V. All rights reserved.
机译:我们调查了磁控溅射过程中生长条件对纳米结构ZnO薄膜的结构,形态和光学性质的影响。在室温下,使用ZnO靶材和各种Ar-O-2溅射气体混合物,通过RF磁控溅射将未掺杂的ZnO薄膜沉积到p型Si(100)和康宁7059玻璃基板上。研究了氧分压对ZnO薄膜结构形态和能带排列的影响。发现厚度,因此从横截面SEM显微图测量的样品的生长速率与溅射室中的氧分压强烈相关。光学透射光谱法的结果表明,在较高的氧分压下,吸收边缘向较长的波长移动。用于确定表面化学结构和价带偏移的X射线光电子能谱(XPS)表明,可以通过改变溅射气氛来控制导带。 (C)2016 Elsevier B.V.保留所有权利。

著录项

  • 来源
    《Applied Surface Science》 |2017年第2期|1458-1465|共8页
  • 作者单位

    Recep Tayyip Erdogan Univ, Dept Phys, TR-53100 Rize, Turkey|Univ Delaware, Dept Mat Sci & Engn, Newark, DE 19716 USA;

    King Mongkuts Univ Technol Thonburi, Nanosci & Nanotechnol Grad Program, Fac Sci, Bangkok 10140, Thailand|King Mongkuts Univ Technol Thonburi, Theoret & Computat Sci Ctr TaCS, Fac Sci, Bangkok 10140, Thailand;

    Univ Delaware, Dept Phys & Astron, Newark, DE 19716 USA;

    Univ Delaware, Dept Mat Sci & Engn, Newark, DE 19716 USA;

    Recep Tayyip Erdogan Univ, Dept Phys, TR-53100 Rize, Turkey;

    Univ Delaware, Dept Mat Sci & Engn, Newark, DE 19716 USA|Univ Delaware, Dept Phys & Astron, Newark, DE 19716 USA;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Nanostructured materials; Oxide films; RF magnetron sputtering; Band gap engineering;

    机译:纳米结构材料氧化膜射频磁控溅射带隙工程;

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