• 主题
高级搜索  >
历史搜索 清空历史
首页> 外文期刊>Applied Surface Science >Enhanced surface area, high Zn interstitial defects and band gap reduction in N-doped ZnO nanosheets coupled with BiVO4 leads to improved photocatalytic performance
【24h】

Enhanced surface area, high Zn interstitial defects and band gap reduction in N-doped ZnO nanosheets coupled with BiVO4 leads to improved photocatalytic performance

机译：掺BiVO4的N掺杂ZnO纳米片的表面积增加，高Zn间隙缺陷和带隙减小导致光催化性能提高

获取原文
获取原文并翻译 | 示例
           
页面导航
  • 摘要
  • 著录项
  • 相似文献
  • 相关主题

摘要

For the first time, a series of Nitrogen-doped-ZnO nanosheet coupled with BiVO4 (N-ZnO/BiVO4) heterojunctioned photocatalysts have been synthesized. The new N-ZnO/BiVO4 material has been prepared via a simple and effective method of precipitation followed by high temperature annealing process. The photocatalytic activities of the N-ZnO/BiVO4 composites were evaluated for the degradation of methylene blue (MB) a common organic pollutant under visible-light irradiation. The results revealed that photo catalytic activity of the coupled system was directly influenced by the percentage amount of BiVO4 in N-ZnO which affected the available exposed surface area for photoreactions. 30% N-ZnO/BiVO4 system exhibited remarkable performance than 10%N-ZnO/BiVO4, 50%N-ZnO/BiVO4, and also to their pristine counterparts. The composite demonstrated the degradation efficiency of 90% in 90min which is 1.76 times the efficiency of pure ZnO for same time duration. This pronounced photocatalytic effect is ascribed to the reduced band gap and lowered recombination rate of ZnO due to nitrogen doping and enhanced low energy charge carrier transitions between zinc interstitial defect bands, formed by the addition of BiVO4 in N-ZnO, to the conduction band of N-ZnO at the interface. Based on the experimental results, a proposed Z-scheme mechanism for the Nitrogen-doped ZnO/BiVO4 photocatalyst was discussed. (C) 2017 Elsevier B.V. All rights reserved.
机译：首次合成了一系列的氮掺杂ZnO纳米片和BiVO4（N-ZnO / BiVO4）异质结光催化剂。新型N-ZnO / BiVO4材料是通过一种简单有效的沉淀方法，然后进行高温退火工艺制备的。评价了N-ZnO / BiVO4复合材料的光催化活性，以研究其在可见光照射下对常见有机污染物亚甲基蓝（MB）的降解。结果表明，偶联体系的光催化活性直接受N-ZnO中BiVO4含量的影响，BiVO4的含量影响光反应的可用暴露表面积。 30％的N-ZnO / BiVO4体系比10％的N-ZnO / BiVO4、50％的N-ZnO / BiVO4以及它们的原始同行表现出卓越的性能。该复合材料在90分钟内的降解效率为90％，是相同时间段纯ZnO效率的1.76倍。这种显着的光催化作用归因于氮掺杂导致的带隙减小和ZnO的重组率降低，以及锌间隙缺陷带之间的低能电荷载流子跃迁（由N-ZnO中的BiVO4添加至导电带）形成。界面处的N-ZnO。基于实验结果，讨论了氮掺杂ZnO / BiVO4光催化剂的Z方案机理。 （C）2017 Elsevier B.V.保留所有权利。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱：kefu@zhangqiaokeyan.com

京公网安备：11010802029741号 ICP备案号：京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有

  • 客服微信

  • 服务号