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首页> 外文期刊>Applied Surface Science >Comparative study of electroless Co-Ni-P plating on Tencel fabric by Co-0-based and Ni-0-based activation for electromagnetic interference shielding
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Comparative study of electroless Co-Ni-P plating on Tencel fabric by Co-0-based and Ni-0-based activation for electromagnetic interference shielding

机译：天丝织物上Co-0基和Ni-0基活化对电磁干扰屏蔽的化学镀Co-Ni-P的比较研究

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The primary objective of this research work was to develop high-performance conductive fabrics with desired electromagnetic interference (EMI) shielding effectiveness (SE), excellent durability and improved corrosion resistance. Such conductive fabrics were fabricated by combining an ultra-low-cost electroless plating method with an alkoxy silane self-assembly technology, which involved successive steps of modification, activation, Co-Ni-P coating deposition and 3-aminopropyltrimethoxysilane (APTMS) thin coatings assembling. Malic acid (MA) was selected to modify the pristine Tencel (TS) substrates, and the probably interaction mechanism was investigated by FT-IR measurement. Co-0 and Ni-0 nanoparticles (NPs) were used as the activators to initiate electroless plating, respectively, and thereby two categories of Co-Ni-P coatings with different Co/Ni atomic ratio were obtained. Both of them presented compact morphologies and preferential (1 1 1) crystal orientation, which were validated by FE-SEM and XRD measurements. Owing to the lower square resistance and higher magnetic properties, the Co-Ni-P coated fabric activated by Co-0 activator showed a higher EMI SE (18.2-40.1 dB) at frequency of 30-1000 MHz. APTMS thin coatings were then assembled on the top of alloy coated fabrics to act as anti-corrosion barriers. Electrochemical polarization measurement in 3.5 wt.% NaCl solution showed that top-APTMS coated conductive fabric exhibited a higher corrosion resistance than the one in absence of APTMS assembly. Overall, the whole process of fabrication could be performed in several hours (or less) without any specialized equipment, which shows a great potential as EMI shielding fabrics in mass-production. (C) 2017 Elsevier B.V. All rights reserved.
机译：这项研究工作的主要目标是开发具有所需电磁干扰（EMI）屏蔽效能（SE），出色的耐久性和改善的耐腐蚀性的高性能导电织物。此类导电织物是通过将超低成本化学镀方法与烷氧基硅烷自组装技术相结合而制成的，烷氧基硅烷自组装技术涉及修饰，活化，Co-Ni-P涂层沉积和3-氨丙基三甲氧基硅烷（APTMS）薄涂层的连续步骤组装。选择苹果酸（MA）修饰原始的Tencel（TS）底物，并通过FT-IR测量研究了可能的相互作用机理。将Co-0和Ni-0纳米粒子（NPs）分别用作活化剂来启动化学镀，从而获得了具有不同Co / Ni原子比的两类Co-Ni-P涂层。他们两个都呈现出紧凑的形态和优先的（1 1 1）晶体取向，这已通过FE-SEM和XRD测量得到了验证。由于较低的方电阻和较高的磁性，由Co-0活化剂活化的Co-Ni-P涂层织物在30-1000 MHz的频率下显示出较高的EMI SE（18.2-40.1 dB）。然后将APTMS薄涂层组装在合金涂层织物的顶部，以充当防腐蚀层。在3.5 wt。％的NaCl溶液中进行电化学极化测量表明，顶层APTMS涂层的导电织物比没有APTMS组件的织物具有更高的耐腐蚀性。总的来说，整个制造过程可以在几个小时（或更短的时间内）内完成，而无需任何专用设备，这在大规模生产中显示出作为EMI屏蔽织物的巨大潜力。 （C）2017 Elsevier B.V.保留所有权利。

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