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Field emission characteristics of diamond nano-tip array fabricated by anodic aluminum oxide template with nano-conical holes

机译:带有纳米锥孔的阳极氧化铝模板制备的金刚石纳米尖端阵列的场发射特性

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Different sizes and periods of diamond nano-tip arrays are fabricated by anodic aluminum oxide (AAO) template with nano-conical holes. Before the anodic oxidation process, 99.5% Al sheets are annealed and electro-polished. AAO templates with nano-conical holes are obtained by continuously changing voltages from 40 to 160 V in 0.3 M oxalic acid at the temperature of -3 degrees C. The aluminum pore of AAO is then removed by the wet etching solution of CuCl and HCl. Diamond nano-particles of diameters of 4-12 nm are adhered to the AAO template as the nucleation sites by Polyethylenimine method. The diamond nano-tip arrays are deposited on the template by microwave plasma chemical vapor deposition with the mixture gas of methane and argon. The diamond nano-tip array of different sizes and periods are obtained after the AAO template is completely removed by NaOH etching. The ratio of nano-tip spacing to the pitch-height (pitch-height ratio) ranges from 1 to about 2.5. The diamond nano-tip array with the smallest spacing-height ratio of 1 by the AAO template with nano-conical holes has the highest field enhancement factor (beta) of 4885 and the lowest turn-on field of about 2.63 V/mu m. (C) 2015 Elsevier B.V. All rights reserved.
机译:通过具有纳米圆锥孔的阳极氧化铝(AAO)模板,可以制造出不同尺寸和不同周期的金刚石纳米尖端阵列。在阳极氧化过程之前,对99.5%的铝板进行退火和电抛光。通过在-3摄氏度的温度下在0.3 M的草酸中将电压从40 V连续更改为160 V,可获得具有纳米锥孔的AAO模板。然后通过CuCl和HCl的湿法蚀刻溶液去除AAO的铝孔。通过聚乙烯亚胺法将直径为4-12nm的金刚石纳米颗粒粘附到AAO模板上作为成核位点。金刚石纳米尖端阵列通过微波等离子体化学气相沉积以及甲烷和氩气的混合气体沉积在模板上。在通过NaOH蚀刻完全去除AAO模板后,获得了不同大小和周期的金刚石纳米尖端阵列。纳米尖端间距与螺距高度的比率(螺距高度比)为1至约2.5。带有纳米锥孔的AAO模板具有最小的间距高度比为1的金刚石纳米尖端阵列具有最高的场增强因子(beta)为4885,最低的开启场约为2.63 V /μm。 (C)2015 Elsevier B.V.保留所有权利。

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