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Influence of modulation period and modulation ratio on structure and mechanical properties of TiBN/CrN coatings deposited by multi-arc ion plating

机译:调制周期和调制比对多弧离子镀TiBN / CrN涂层结构和力学性能的影响

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摘要

TiBN/CrN multilayered superlattice coatings with modulation periods Lambda (bilayer thickness) ranging from 22.5 to 4.2 nm and modulation ratio R (the thickness ratio of CrN and TiBN layers) ranging from 6:1 to 3:1 were synthesized using an industrial-scale cathodic arc ion plating system in an Ar-N-2 gas mixture. X-ray diffraction (XRD), transmission electron microscopy (TEM) and nanoindention were employed to investigate the influence of modulation period and ratio on microstructure and mechanical properties of the multilayers. The sharp interfaces and nanoscale multilayered modulation were confirmed by TEM. TiBN/CrN multilayer coatings were crystallized with orientations at the (1 1 1), (2 0 0) and (2 2 0) crystallographic planes and the microstructure was strengthened at (2 0 0) preferred orientation. The maximum hardness of 38.6 GPa and elastic modulus of 477 GPa were obtained at Lambda = 11.7 nm and R = 5:1. The lowest value of the friction coefficient at 0.32 sliding against a WC-Co ball was obtained at a bilayer period of 11.7 nm, compared to those of the coatings with other modulation periods and monolithic coatings. The wear rate of the multilayered coatings was also lower than those of the monolithic CrN and TiBN coatings. (C) 2015 Elsevier B.V. All rights reserved.
机译:使用工业规模合成调制周期Lambda(双层厚度)在22.5至4.2 nm范围内且调制比R(CrN和TiBN层的厚度比)在6:1至3:3范围内的TiBN / CrN多层超晶格涂层Ar-N-2气体混合物中的阴极电弧离子镀系统。利用X射线衍射(XRD),透射电子显微镜(TEM)和纳米压痕研究了调制时间和比例对多层膜的微观结构和力学性能的影响。透射电镜证实了其尖锐的界面和纳米级多层调制。 TiBN / CrN多层涂层在(1 1 1),(2 0 0)和(2 2 0)晶面的取向上结晶,并且在(2 0 0)优先取向上增强了显微组织。在Lambda = 11.7 nm和R = 5:1时可获得38.6 GPa的最大硬度和477 GPa的弹性模量。与具有其他调制周期的涂层和整体式涂层相比,在11.7 nm的双层周期中,在WC-Co球上滑动时摩擦系数最低,为0.32。多层涂层的磨损率也低于整体式CrN和TiBN涂层。 (C)2015 Elsevier B.V.保留所有权利。

著录项

  • 来源
    《Applied Surface Science》 |2015年第1期|1116-1121|共6页
  • 作者单位

    Wuhan Univ, Minist Educ, Key Lab Artificial Micro & Nanomat, Wuhan 430072, Peoples R China|Wuhan Univ, Sch Phys & Technol, Wuhan 430072, Peoples R China;

    Wuhan Univ, Minist Educ, Key Lab Artificial Micro & Nanomat, Wuhan 430072, Peoples R China|Wuhan Univ, Sch Phys & Technol, Wuhan 430072, Peoples R China;

    Wuhan Univ, Minist Educ, Key Lab Artificial Micro & Nanomat, Wuhan 430072, Peoples R China|Wuhan Univ, Sch Phys & Technol, Wuhan 430072, Peoples R China;

    Wuhan Univ, Sch Power & Mech Engn, Wuhan 430072, Peoples R China;

    Wuhan Univ, Minist Educ, Key Lab Artificial Micro & Nanomat, Wuhan 430072, Peoples R China|Wuhan Univ, Sch Phys & Technol, Wuhan 430072, Peoples R China;

    Wuhan Univ, Minist Educ, Key Lab Artificial Micro & Nanomat, Wuhan 430072, Peoples R China|Wuhan Univ, Sch Phys & Technol, Wuhan 430072, Peoples R China;

    Wuhan Univ, Minist Educ, Key Lab Artificial Micro & Nanomat, Wuhan 430072, Peoples R China|Wuhan Univ, Sch Phys & Technol, Wuhan 430072, Peoples R China;

    Wuhan Univ, Minist Educ, Key Lab Artificial Micro & Nanomat, Wuhan 430072, Peoples R China|Wuhan Univ, Sch Phys & Technol, Wuhan 430072, Peoples R China|Acad Sci Uzbek, Inst Ion Plasma & Laser Technol, Tashkent 700135, Uzbekistan;

    Wuhan Univ, Minist Educ, Key Lab Artificial Micro & Nanomat, Wuhan 430072, Peoples R China|Wuhan Univ, Sch Phys & Technol, Wuhan 430072, Peoples R China;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    TiBN/CrN multilayer; Cathodic arc ion plating; Modulation period; Modulation ratio;

    机译:TiBN / CrN多层板;阴极电弧离子镀;调制周期;调制比;

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