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首页> 外文期刊>Applied Surface Science >The influence of deposition temperature on microstructure and corrosion resistance of ZrO_xN_y/ZrO_2 coatings deposited using RF sputtering
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The influence of deposition temperature on microstructure and corrosion resistance of ZrO_xN_y/ZrO_2 coatings deposited using RF sputtering

机译：沉积温度对RF溅射沉积ZrO_xN_y / ZrO_2涂层组织和耐蚀性的影响

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摘要

This paper reports the influence of substrate temperature on the structure, morphology and corrosion resistance of ZrO_xN_y/ZrO_2 thin films deposited on 304 stainless steel using radio frequency sputtering (RF sputtering). Structural analysis was carried out by X-ray diffraction (XRD); morphological analysis was performed using scanning electron microscopy (SEM) and atomic force microscopy (AFM) and surface chemical analysis was determined using X-ray photoelectron spectroscopy (XPS). XRD data showed that the films deposited at 300 ℃ (573 K) and 350 ℃ (623 K) result in the growth of a monoclinic zirconium oxynitride phase with preferential orientation along the (-111) plane, while at 14℃ (287 K) the predominant phase is of polycrystalline ZrO_2. The corrosion results indicate that the coatings provide good resistance to corrosion in chloride-containing media, being better in the film deposited at 350 ℃ (623 K). SEM analysis demonstrated the homogeneity of the films deposited at the three temperatures; AFM studies established the average roughness of the films to be 4.25 nm. The binding energies of the Zr 3d, N 1s, and O 1s core levels determined by XPS were all compatible with the formation of a zirconium oxynitride and zirconium oxide in the surface of the film. ZrO_xN_y/ZrO_2 thin films are promising candidates for increasing the corrosion resistance of the steels in chloride-rich environments.
机译：本文报道了基体温度对射频溅射（RF溅射）沉积在304不锈钢上的ZrO_xN_y / ZrO_2薄膜的结构，形貌和耐蚀性的影响。结构分析通过X射线衍射（XRD）进行；使用扫描电子显微镜（SEM）和原子力显微镜（AFM）进行形态分析，并使用X射线光电子能谱（XPS）确定表面化学分析。 XRD数据表明，在300℃（573 K）和350℃（623 K）下沉积的薄膜导致单斜晶氮氧化锆相沿（-111）晶面优先取向，而在14℃（287 K）晶格生长。主要相为多晶ZrO_2。腐蚀结果表明，该涂层在含氯化物的介质中具有良好的耐腐蚀性，在350℃（623 K）的沉积膜中具有更好的腐蚀性能。 SEM分析表明，在这三个温度下沉积的薄膜均一。 AFM研究确定薄膜的平均粗糙度为4.25 nm。用XPS测定的Zr 3d，N 1s和O 1s核心能级的结合能都与在膜表面形成氮氧化锆和氧化锆相适应。 ZrO_xN_y / ZrO_2薄膜是增加钢在富含氯化物环境中的耐腐蚀性的有前途的候选材料。

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  • 来源
    《Applied Surface Science》 |2014年第1期|181-187|共7页
  • 作者

    G.I. Cubillos; M. Bethencourt; J.J. Olaya; J.E. Alfonso; J.F. Marco;

  • 作者单位

    Department of Chemistry, Faculty of Science, National University of Colombia, Av. Cra. 30 No 45-03, Bogota, Colombia;

    Department of Materials Science, Metallurgy Engineering and Inorganic Chemistry, International Campus of Excellence of the Sea (CEI-MAR), University of Cadiz, Avda. Republica Saharaui s, 11510 Puerto Real, Cadiz, Spain;

    Department of Mechanical Engineering, Faculty of Engineering, National University of Colombia, Bogota, Colombia;

    Department of Physic, Faculty of Science, National University of Colombia, Av. Cra. 30 No 45-03, Bogota, Colombia;

    Instituto de Quimica Fisica 'Rocasolano', CSIC, C/Serrano 119, 28006 Madrid, Spain;

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  • 正文语种 eng
  • 中图分类
  • 关键词

    Zirconium oxinitride; Radio frequency sputtering; Texture;

    机译：氧氮化锆;射频溅射;质地;

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