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首页> 外文期刊>Applied Surface Science >Preparation of silane-functionalized silica films via two-step dip coating sol-gel and evaluation of their superhydrophobic properties
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Preparation of silane-functionalized silica films via two-step dip coating sol-gel and evaluation of their superhydrophobic properties

机译：两步浸涂溶胶-凝胶法制备硅烷官能化二氧化硅薄膜及其超疏水性评价

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In this paper, we study the two-step dip coating via a sol-gel process to prepare superhydrophobic silica films on the glass substrate. The water repellency of the silica films was controlled by surface silyla-tion method using isooctyltrimethoxysilane (iso-OTMS) as a surface modifying agent. Silica alcosol was synthesized by keeping the molar ratio of ethyltriethoxysilane (ETES) precursor, ethanol (EtOH) solvent, water (H_2O) was kept constant at 1:36:6.6 respectively, with 6 M NH_4OH throughout the experiment and the percentages of hydrophobic agent in hexane bath was varied from 0 to 15 volX The static water contact angle values of the silica films increased from 108° to 160° with an increase in the vol.% of iso-OTMS. At 15 vol%. of iso-OTMS, the silica film shows static water contact angle as high as 160°. The superhydrophobic silica films are thermally stable up to 440 ℃ and above this temperature, the silica films lose superhydrophobicity. By controlling the primer particle size of SiO_2 about 26 nm, leading to decrease the final size of silica nanoparticles after modification of nanoparticles by isooctyltrimethoxysilane about 42 nm. The films are transparent and have uniform size on the surface. The silica films have been characterized by atomic force microscopy (AFM), fourier transform infrared spectroscopy (FT-IR), transparency, contact angle measurement (CA), Zeta-potential, Thermal stability by TG-DTA analysis.
机译：在本文中，我们研究了通过溶胶-凝胶法进行的两步浸涂，以在玻璃基板上制备超疏水二氧化硅膜。使用异辛基三甲氧基硅烷（iso-OTMS）作为表面改性剂，通过表面甲硅烷基化法控制二氧化硅膜的疏水性。通过保持乙基三乙氧基硅烷（ETES）前驱体，乙醇（EtOH）溶剂，水（H_2O）的摩尔比分别保持恒定于1：36：6.6来合成二氧化硅醇，整个实验过程中均使用6 M NH_4OH和疏水剂的百分比随着iso-OTMS的体积百分数增加，二氧化硅膜在己烷浴中的静水接触角值从108o增加到160o。含量为15％。在iso-OTMS中，二氧化硅膜的静态水接触角高达160°。超疏水性二氧化硅薄膜在高达440℃的温度下具有热稳定性，在此温度以上，二氧化硅薄膜会失去超疏水性。通过将SiO_2的底漆粒径控制在约26nm，导致在通过异辛基三甲氧基硅烷改性纳米粒子后将二氧化硅纳米粒子的最终尺寸减小到约42nm。这些膜是透明的，并且在表面上具有均匀的尺寸。通过原子力显微镜（AFM），傅立叶变换红外光谱（FT-IR），透明度，接触角测量（CA），Zeta电位，TG-DTA分析的热稳定性来表征二氧化硅膜。

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