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The impact of thermal annealing on the morphology of sputter deposited platinum clusters into anodic aluminum oxide pores

机译：热退火对溅射沉积在阳极氧化铝孔中的铂簇的形貌的影响

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摘要

The influence of post deposition annealing (PDA) up to temperatures of T_(pda)=900 ℃ on the morphology and agglomeration behavior of ambient temperature sputter deposited platinum onto anodic aluminum oxide templates is investigated. Both cluster agglomeration and diffusion processes occur on the surface and on the inner channel walls. When the annealing temperature is less than 400 ℃, particles are diffusing inside the channels. Around T_(pda)= 400℃, a particle agglomeration process is taking place. A diffusion process is playing an important role and the Pt particles are able to reach a depth of 12 μm. The surface morphology exhibits a remarkable change for annealing temperature above 600 ℃, where Pt is migrating on the outermost surface for forming flat films. When further enhancing T_(pda) to 900 ℃, the particles on the surface and in the channels agglomerate together to form separated large flat islands. Moreover, the maximum channel depth where platinum is present is around 12 μm.
机译：研究了温度高达T_（pda）= 900℃的后沉积退火（PDA）对环境温度溅射沉积在阳极氧化铝模板上的铂的形貌和聚集行为的影响。团簇的聚集和扩散过程都发生在表面和内部通道壁上。当退火温度低于400℃时，颗粒在通道内扩散。在T_（pda）= 400℃附近，正在发生粒子团聚过程。扩散过程起着重要作用，Pt颗粒能够达到12μm的深度。当退火温度超过600℃时，表面形貌发生了显着变化，其中Pt在最外层表面迁移，形成了平坦的薄膜。当将T_（pda）进一步提高到900℃时，表面和通道中的颗粒会聚结在一起，形成分离的大平面岛。此外，存在铂的最大通道深度约为12μm。

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  • 来源
    《Applied Surface Science》 |2013年第1期|400-404|共5页
  • 作者

    Sujuan Wu; Pascal Brault; Cong Wang; Blandine Courtois;

  • 作者单位

    CREMI UMR 7344 CNRS-Universite d'Orleans, 14, rue d'Issoudun BP 6744, F-45067 Orleans Cedex 2, France, School of Materials Science and Engineering, Chongqing University, Chongqing 400045, China,Center for Condensed Matter and Material Physics, School of Science, Beihang University, Beijing 100191, China;

    CREMI UMR 7344 CNRS-Universite d'Orleans, 14, rue d'Issoudun BP 6744, F-45067 Orleans Cedex 2, France;

    Center for Condensed Matter and Material Physics, School of Science, Beihang University, Beijing 100191, China;

    CEMHTI, UPR3079 CNRS, 1D av Recherche Scientifique, 45071 Orleans cedex 2, France;

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  • 原文格式 PDF
  • 正文语种 eng
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  • 关键词

    deposition; sputtering; nanoparticles; porous materials; thin films; interfaces;

    机译：沉积溅射纳米粒子多孔材料薄膜;介面;

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